Effective attenuation length of Al Kα-excited Si2p photoelectrons in SiO2, Al2O3 and HfO2 thin films

Journal of Electron Spectroscopy and Related Phenomena

Volumn 149, Issue 1-3, 2005, Pages 37-44

  Vitchev, R G ^a   Defranoux, Chr ^b   Wolstenholme, J ^c   Conard, T ^d   Bender, H ^d   Pireaux, J J ^a  

^a UNIVERSITY OF NAMUR   (Belgium)

^b SOPRA   (France)

^c Thermo Electron   (United Kingdom)

^d IMEC   (Belgium)

Author keywords

Effective attenuation length; High k material; XPS

Indexed keywords

APPROXIMATION THEORY; ATTENUATION; DATABASE SYSTEMS; ELECTRON SPECTROSCOPY; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY;

EFFECTIVE ATTENUATION LENGTH; HIGH-K MATERIALS; NIST DATABASE; PHOTOELECTRON COUNTING RATES;

THIN FILMS;

EID: 25144494312     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.elspec.2005.06.004     Document Type: Article

References (22)

1. A. Jablonski, and C.J. Powell Surf. Sci. Rep. 47 2002 33
2. O.A. Baschenko, and V.I. Nefedov J. Electron Spectrosc. Relat. Phenom. 17 1979 409
3. P.J. Cumpson, and M.P. Seah Surf. Interf. Anal. 25 1997 430
4. V.I. Nefedov J. Electron Spectrosc. Relat. Phenom. 100 1999 1
5. C.J. Powell, and A. Jablonski J. Vac. Sci. Technol. A 19 2001 2604
6. C.J. Powell, and A. Jablonski NIST Electron Effective Attenuation Length Database-Version 1.0 2001 National Institute of Standards and Technology Gaithersburg, MD
7. M.P. Seah D. Briggs M.P. Seah Practical Surface Analysis: Auger and X-ray Photoelectron Spectroscopy vol. 1 1990 Wiley Chichester 201
8. M.P. Seah, and S.J. Spencer Surf. Interf. Anal. 33 2002 640
9. M.P. Seah, and S.J. Spencer Surf. Interf. Anal. 35 2003 515
10. M.P. Seah, S.J. Spencer, F. Bensebaa, I. Vickridge, H. Danzebrink, M. Krumrey, T. Gross, W. Oesterle, E. Wendler, B. Rheinlander, Y. Azuma, I. Kojima, N. Suzuki, M. Suzuki, S. Tanuma, D.W. Moon, H.J. Lee, Hyun Mo Cho, H.Y. Chen, T. Wee, OsipowiczF A.T.C., J.S. Pan, W.A. Jordaan, R. Hauert, U. Klotz, C. van der Marel, M. Verheijen, Y. Tamminga, C. Jeynes, P. Bailey, S. Biswas, U. Falke, N.V. Nguyen, D. Chandler-Horowitz, J.R. Ehrstein, D. Muller, and J.A. Dura Surf. Interf. Anal. 36 2004 1269
11. S. Miyazaki Appl. Surf. Sci. 190 2002 66
12. S. Tanuma, C.J. Powell, and D.R. Penn Surf. Interf. Anal. 21 1993 165
13. S. Brandt Data Analysis: Statistical and Computational Methods for Scientists and Engineers 1999 Springer New York
14. M.P. Seah, and S.J. Spencer J. Vac. Sci. Technol. A 21 2003 345
15. R. Mishra, S.P. Tripathy, D. Sinha, K.K. Dwivedi, S. Ghosh, D.T. Khathing, M. Müller, D. Fink, and W.H. Chung Nucl. Instrum. Meth. Phys. Res. B 168 2000 59
16. J.J. Pireaux, J. Riga, R. Caudano, J.J. Verbist, J. Delhalle, S. Delhalle, J.M. Andre, and Y. Gobillon Phys. Scripta 16 1977 329
17. P.J. Cumpson Surf. Interf. Anal. 31 2001 23
18. G.D. Wilk, R.M. Wallace, and J.M. Anthony J. Appl. Phys. 89 2001 5243
19. C.J. Powell, and A. Jablonski J. Electron Spectrosc. Relat. Phenom. 114-116 2001 1139
20. H. Nohira, W. Tsai, W. Besling, E. Young, J. Petry, T. Conard, W. Vandervorst, S. De Gendt, M. Heyns, J. Maes, and M. Tuominen J. Noncryst. Solids 303 2002 83
21. Application Note: 31069, Thermo Electron Corporation, 2005.
22. C.J. Powell, A. Jablonski, W.S.M. Werner, and W. Smekal Appl. Surf. Sci. 239 2005 470