157-nm single-layer resists based on main-chain-fluorinated polymers

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3743-3747

  Irie, Shigeo ^a   Ishikawa, Seiichi ^a   Hagiwara, Takuya ^a   Yamazaki, Tamio ^a   Furukawa, Takamitsu ^a   Itani, Toshiro ^a   Kawaguchi, Yasuhide ^b   Kodama, Syun Ichi ^b   Yokokoji, Osamu ^b   Kaneko, Isamu ^b   Takebe, Yoko ^b   Okada, Shinji ^b  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b ASAHI GLASS CO LTD   (Japan)

Author keywords

157 nm lithography; Chemically amplified resist; Dry etching resistance; Fluoropolymer; Protecting group; Single layer resist

Indexed keywords

ABSORPTION; ANTIREFLECTION COATINGS; DRY ETCHING; PHOTORESISTS;

SINGLE-LAYER RESISTS;

FLUORINE CONTAINING POLYMERS;

EID: 12444278293     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3743     Document Type: Conference Paper

References (8)

1. T. H. Fedynyshyn, R. R. Kunz, R. F. Sinta, M. Sworin, W. A. Mowers, R. B. Goodman and S. P. Doran: Proc. SPIE 4345 (2001) 296.
2. H. Ito, G. M. Wallraff, P. Brock, N. Fender, H. Truong, G. Breyta, D. C. Miller, M. H. Sherwood and R. D. Allen: Proc. SPIE 4345 (2001) 273.
3. R. J. Hung, H. V. Tran, B. C. Trinque, T. Chiba, S. Yamada, D. P. Sanders, E. F. Connor, R. H. Grubbs, J. Klopp, J. M. J. Frechet, B. H. Thomas, G. J. Shafer, D. D. DesMarteau, W. Conley and C. G. Willson: Proc. SPIE 4345 (2001) 385.
4. D. Schmaljohann, Y. C. Bae, G. L. Weibel, A. H. Hamad and C. K. Ober: Proc. SPIE 3999 (2000) 330.
5. M. K. Crawford, A. E. Feiring, J. Feldman, R. H. French, V. A. Petrov, F. L. Schadt III, R. J. Smalley and F. C. Zumsteg: Proc. SPIE 4345 (2001) 428.
6. M. Toriumi, S. Ishikawa, S. Miyoshi, T. Naito, T. Yamazaki, M. Watanabe and T. Itani: Proc. SPIE 4345 (2001) 371.
7. S. Kodama, I. Kaneko, Y. Takebe, S. Okada, Y. Kawaguchi, N. Shida, S. Ishikawa, M. Toriumi and T. Itani: Proc. SPIE 4690 (2002) 10.
8. N. Shida, H. Watanabe, T. Yamazaki, S. Ishikawa, M. Toriumi and T. Itani: Proc. SPIE 4690 (2002) 55.