Domain decomposition methods for the rapid electromagnetic simulation of photomask scattering

Journal of Microlithography, Microfabrication and Microsystems

Volumn 1, Issue 3, 2002, Pages 253-269

  Adam, Konstantinos ^a,b   Neureuther, Andrew R ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

Alternating phase shifting mask; Domain decomposition method; Scattering simulation

Indexed keywords

EID: 3843137666     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1506178     Document Type: Article

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