Measurements of water distribution in thin lithographic films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 56-62

  Vogt, Bryan D ^a   Soles, Christopher L ^a   Prabhu, Vivek M ^a   Jones, Ronald L ^a   Wu, Wen Li ^a   Lin, Eric K ^a   Goldfarb, Dario L ^b   Angelopoulos, Marie ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

Author keywords

Neutron reflectivity; Thin films; Water immersion; X ray reflectivity

Indexed keywords

IMMERSION LITHOGRAPHY; NEUTRON REFLECTIVITY; WATER IMMERSION; X-RAY REFLECTIVITY;

CONCENTRATION (PROCESS); HYDROPHILICITY; MOISTURE; NEUTRON SOURCES; PHOTORESISTS; POLYMERS; SILICON WAFERS; SUBSTRATES; SURFACE TREATMENT; THERMODYNAMIC PROPERTIES; THICK FILMS; THIN FILMS; ULTRAVIOLET RADIATION; X RAY ANALYSIS;

PHOTOLITHOGRAPHY;

EID: 3843075155     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535881     Document Type: Conference Paper

References (12)

1. The data throughout the manuscript and the figures are presented along with the standard uncertainty (±) involved in the measurement based on one standard deviation.
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