Resist pattern collapse with top hounding resist profile

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 6 B, 2003, Pages 3922-3927

  Lee, Hyung Joo ^a   Park, Jun Teak ^a   Yoo, Ji Yong ^a   An, Ilsin ^a   Oh, Hye Keun ^a  

^a Hanyang University   (South Korea)

Author keywords

Aspect ratio; Collapse; Contact angle; Deformation; Line width; Lithography; Pattern; Resist; Rounded top; Surface tension; Top roundlng; Young's modulus

Indexed keywords

ASPECT RATIO; COMPUTER SIMULATION; CONTACT ANGLE; DEFORMATION; ELASTIC MODULI; SURFACE TENSION;

RESIST PATTERN COLLAPSE;

LITHOGRAPHY;

EID: 0042362289     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.3922     Document Type: Conference Paper

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