Relation between electron- and photon-caused oxidation in EUVL optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 I, Issue , 2003, Pages 477-486

  Malinowski, Michael E ^a   Steinhaus, Charles A ^a   Meeker, Donald E ^a   Clift, W Miles ^a   Klebanoff, Leonard E ^a   Bajt, Saša ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

Author keywords

Electrons; ETS; Extreme ultraviolet; Multilayer mirror; Oxidation; Photoelectrons

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; ELECTRON BEAMS; ELECTRONS; LIGHT REFLECTION; MIRRORS; OPTICAL MULTILAYERS; OPTICS; OXIDATION; PHOTONS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS; VAPORS;

EXTREME ULTRAVIOLET LITHOGRAPHY; MULTILAYER MIRRORS; PHOTOELECTRONS; WATER VAPOR;

LITHOGRAPHY;

EID: 0141610699     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)

1. S. Bajt, J.B. Alameda, T.W.Barbee, W. M. Clift, B. Kaufmann, E.A. Spiller, Optical Engineering, 41(2002)1797.
2. M.E. Malinowski, P. Grunow, C. Steinhaus, W.M. Clift, L. Klebanoff, Proceedings of SPIE 4343 (2001) 347.
3. R. Oren and S. K. Ghandhi. J. Appl. Phys. 42 (1971) 752.
4. S.A. Schafer and S. A. Lyon. J. Vac. Sci. Technol. 19 (1981)494.
5. I.A. Boyd. Appl. Phys. Lett. 42 (1983) 728.
6. R. R. Kunz and T. M. Mayer, J. Vac. Sci. Technol. B5 (1987) 427.
7. Hamamatsu G1127-02 GaAsP photodiode , ̃ 1/8 A/W responsivity at 92.3 eV
8. W. Gudat and C. Kunz, Phys. Rev. Letters 29 (1972) 169.
9. Alan Owens, S. C. Bayliss, G. W. Fraser, S. J. Gurman, Nucl. Instr. Meth. in Phys. Res. A 385(1997) 556.
10. M. E. Malinowski, C. Steinhaus, M. Clift, L.E. Klebanoff, S. Mrowka, R. Soufli, Proceedings of SPIE 4688 (2002)347.
11. M. P. Seah and W.A. Dench, Surf. And Interface Analysis 1 (1972)2.
12. J. C. Ashley and C. J. Tung, Surf. And Interface Analysis 14 (1982)52.
13. K. Boller, R.-P. Haelbich, H. Hogrefe, W. Jark and C. Kunz, Nucl. Instrum. And Meth. 208 (1983) 273.
14. R. A.Rosenberg and D. C. Mancini, Nucl. Instrum. And Meth. In Physics Research A291 (1990) 101.
15. T. Koide, S. Sata, T. Shidara, M. Niwano, M. Yanagihara, A. Yamada, A. Fujimori, A. Mikuni, H. Kato, and T. Miyahara, Nucl. Instrum. And Meth., in Physics Research A246 (1986) 215.
16. A review of, and references related to, the oxidation of Si is given in S. Wolf and R. N. Tauger, "Silicon Processing for the VLSI Era," Chap. 7 (Lattice Press, Sunset Beach, CA, 1986).