Metrology of laser-produced plasma light source for EUV lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5752, Issue III, 2005, Pages 1248-1256

  Bowering N R ^a   Hoffman, J R ^a   Khodykin, O V ^a   Rettig, C L ^a   Hansson, B A M ^a   Ershov, A I ^a   Fomenkov, I V ^a  

^a CYMER INC   (United States)

Author keywords

Energy monitor; EUV lithography; EUV metrology; Out of band radiation; Pinhole camera; Spectral distribution; Spectrometer

Indexed keywords

CAMERAS; DETECTORS; LASER PRODUCED PLASMAS; LIGHT SOURCES; METAL FOIL; MIRRORS; SPECTROMETERS; SPECTROSCOPIC ANALYSIS;

ENERGY MONITOR; EUV LITHOGRAPHY; EXTREME ULTRAVIOLET (EUV) METROLOGY; OUT-OF-BAND RADIATION; PINHOLE CAMERA; SPECTRAL DISTRIBUTION;

LITHOGRAPHY;

EID: 24644444658     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600809     Document Type: Conference Paper

References (16)

1. K. Ota, Y. Watanabe, H. Franken, V. Banine, in: Proc. Int. Sematech EUV Source Workshop, Santa Clara (22 Feb. 2004).
2. R. Stuik, R. Constantinescu, P. Hegeman, J. Jonkers, H. Fledderus, V. Banine, and F. Bijkerk, in: Proc. of SPIE Vol. 4146, Soft X-Ray and EUV Imaging Systems, W. M. Kaiser and R. H. Stulen, Eds., 121-127 (2000).
3. R. Stuik, F. Scholze, J. Tümmler, F. Bijkerk, Nucl. Instrum. Meth. A 492, 305-316 (2002).
4. F. Scholze, G. Brandt, P. Müller, B. Meyer, F. Scholz, J. Tümmler, K. Vogel, and G. Ulm, in: Proc. of SPIE Vol. 4688, 680-689 (2002).
5. M. C. Schürmann, T. Missalla, K. Mann, S. Kranzusch, R. M. Klein, F. Scholze, G. Ulm, R. Lebert, L. Juschkin, in: Proc. of SPIE Vol. 5037, Emerging Lithographic Technologies VII, R. L. Engelstad, Ed., 378-388 (2003).
6. W. N. Partlo, I. V. Fomenkov, R. M. Ness, R. I. Oliver, S. T Melnychuk, and J. E. Rauch, in: Proc. of SPIE Vol. 4343, Emerging Lithographic Technologies V, E. A. Dobisz, Ed., 232-248 (2001).
7. I. V. Fomenkov, R. M. Ness, I. R. Oliver, S. T. Melnychuk, O. V. Khodykin, N. R. Böwering, C. L. Rettig, J. R. Hoffman, in: Proc. of SPIE Vol. 5037, Emerging Lithographic Technologies VII, R. L. Engelstad, Ed., 807-821 (2003).
8. I. V. Fomenkov, R. M. Ness, I. R. Oliver, S. T. Melnychuk, O. V. Khodykin, N. R. Böwering, C. L. Rettig, J. R. Hoffman, in: Proc. of SPIE Vol. 5374, Emerging Lithographic Technologies VIII, R. S. Mackay, Ed., 168-182 (2004).
9. I. V. Fomenkov, N. Böwering, C. L. Rettig, S. T. Melnychuk, I. R. Oliver, J. R. Hoffman, O. V. Khodykin, R. M. Ness and W. N. Partlo, J. Phys. D: Appl. Phys. 37, 3266-3276 (2004).
10. E. M. Gullikson, R. Korde, L. R. Canfield, and R. E. Vest, J. Electron Spectrosc. Rel. Phen. 80, 313-316 (1996).
11. R. Stuik and F. Bijkerk, Nucl. Instrum. Meth. A 489, 370-378 (2002).
12. V. Banine and R. Moors, in: Proc. of SPIE Vol 4343, Emerging Lithographic Technologies V, E. A. Dobisz, Ed., 203-214 (2001).
13. N. Böwering, M. Martins, W. N. Partlo, and I. V. Fomenkov, J. Appl. Phys. 95, 16-23 (2004).
14. T. Kita, T. Harada, N. Nakano, and H. Kuroda, Appl. Opt. 22, 512-513 (1983).
15. N. Nakano, H. Kuroda, T. Kita, and T. Harada, Appl. Opt. 23, 2386-2392 (1984).
16. G. O'Sullivan and R. Faulkner, Opt. Eng. 33, 3978 (1994).