Performance and scaling of a dense plasma focus light source for EUV lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 807-821

  Fomenkov, Igor V ^a   Ness, Richard M ^a   Oliver, Ian R ^a   Melnychuk, Stephan T ^a   Khodykin, Oleh V ^a   Böwering, Norbert R ^a   Rettig, Curtis L ^a   Hoffman, Jerzy R ^a  

^a CYMER INC   (United States)

Author keywords

Dense plasma focus; DPF; EUV light source; EUV lithography; Plasma pinch; Xe emission

Indexed keywords

CATALYSIS; COOLING; EROSION; FOCUSING; LIGHT SOURCES; OPTIMIZATION; PLASMA SOURCES; PLASMAS; ULTRAVIOLET RADIATION;

DENSE PLASMA FOCUS; EXTREME ULTRAVIOLET LITHOGRAPHY; HIGH VOLUME MANUFACTURING; PLASMA PINCH;

PHOTOLITHOGRAPHY;

EID: 0141724652     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.505303     Document Type: Conference Paper

References (10)

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2. W. N. Partlo, I. V. Fomenkov, R. M. Ness, R. I. Oliver, S. T. Melnychuk J. E. Rauch, "Progress Toward Use of a Dense Plasma Focus as a Light Source for Production EUV Lithography", in Proc. of SPIE Vol. 4343, Emerging Lithographic Technologies V, ed. by E. A. Dobisz, p. 232 (2001).
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