Positive-tone wafer coating materials evaluation on lithography process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4277, Issue , 2001, Pages 375-380

  Huang, D F ^a   Chiou, J Y ^a   Hung, C C ^a   Young, B R ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

PBO; Polyimide; Positive

Indexed keywords

INSULATING MATERIALS; MICROELECTRONICS; OPTICAL FILMS; PASSIVATION; PHOTOLITHOGRAPHY; PHOTOSENSITIVITY; PROTECTIVE COATINGS; SEMICONDUCTOR DEVICE MANUFACTURE;

INSULATING FILMS; WAFER COATING MATERIALS;

POLYIMIDES;

EID: 0034943709     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.426818     Document Type: Conference Paper

References (4)

1. Production of highly heat-resistant film pattern from photoreactive precursors. Part 1. General principle
2. Preparation of fully aromatic polybenzoxazoles