Growth of cubic boron nitride films by RF reactive sputter

Thin Solid Films

Volumn 368, Issue 2, 2000, Pages 312-314

  Deng, Jinxiang ^a   Wang, Bo ^a   Tan, Liwen ^a   Yan, Hui ^a   Chen, Guanghua ^a  

^a BEIJING UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; ELECTRIC RESISTANCE MEASUREMENT; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HOT PRESSING; POSITIVE IONS; SILICON WAFERS; SPUTTERING; THIN FILMS;

CUBIC BORON NITRIDE FILM; RADIO FREQUENCY REACTIVE SPUTTER;

CUBIC BORON NITRIDE;

EID: 0033703001     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00790-2     Document Type: Article

References (6)

1. Fahy S. Phys. Rev. B. 51:1995;12873.
2. Ehrhardt H. Surf. Coat. Technol. 74/75:1995;29.
3. Vel L., Demazeau G., Etourneau J. Mater. Sci. Eng. B. 10:1991;149.
4. Ichinose Y., Saitoh H., Hftirotsu Y. Surf. Coat. Technol. 43/44:1990;116.
5. Smftirnova T.P., Jakovkina L.V., Jashkin I.L., Sysoera N.P., Amosor I. Thin Solid Films. 237:1994;32.
6. Mftirkarrimi P.B., McCarty K.F., Medlin D.L. Mater. Sci. Eng. R. 21:1997;51-53.