Surface microstructuring of transparent materials by laser-induced backside wet etching using excimer laser

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5063, Issue , 2003, Pages 193-201

  Niino, Hiroyuki ^a   Ding, Ximing ^a   Kurosaki, Ryozo ^a   Narazaki, Aiko ^a   Sato, Tadatake ^a   Kawaguchi, Yoshizo ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Bubble; Laser ablation; Micromachining; Ns pulsed UV excimer laser; Shockwave; Silica glass; Time resolved shadowgraph microscopy

Indexed keywords

ABSORPTION; ATMOSPHERIC PRESSURE; DEPOSITION; ETCHING; EXCIMER LASERS; LASER APPLICATIONS; LASER BEAM EFFECTS; MICROMACHINING; MICROSTRUCTURE; ORGANIC SOLVENTS; SHOCK WAVES; VACUUM; WAVE PROPAGATION;

BUBBLE; NS-PULSED UV EXCIMER LASER; TIME-RESOLVED SHADOWGRAPH MICROSCOPY;

FUSED SILICA;

EID: 2342586119     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.540486     Document Type: Conference Paper

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