Optimization and analysis of NF 3 in situ chamber cleaning plasmas

Journal of Applied Physics

Volumn 95, Issue 8, 2004, Pages 4452-4462

  Ji, Bing ^a   Yang, James H ^a   Badowski, Peter R ^a   Karwacki, Eugene J ^a  

^a AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN OF EXPERIMENTS (DOE); DESTRUCTION EFFICIENCIES (DE); OPTICAL EMISSION SPECTROSCOPY (OES); PERFLUOROCARBONS (PFC);

ARGON; CHEMICAL REACTORS; CLEANING; CORRELATION METHODS; EMISSION SPECTROSCOPY; ESTIMATION; FLUOROCARBONS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HELIUM; NITROGEN COMPOUNDS; OPTIMIZATION; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 2342467500     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1688996     Document Type: Article

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