PFCs in the semiconductor industry: a primer

Semiconductor International

Volumn 23, Issue 8, 2000, Pages

  Van Gompel, Joe ^a,b,c  

^a BOC Edwards   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

^c AMERICAN CHEMICAL SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EMISSION REDUCTION; PERFLUOROCARBONS; SEMICONDUCTOR INDUSTRY;

AIR POLLUTION CONTROL; ENVIRONMENTAL PROTECTION; FLUOROCARBONS; GAS EMISSIONS; GLOBAL WARMING; RESEARCH AND DEVELOPMENT MANAGEMENT; STRATEGIC PLANNING; TECHNOLOGY TRANSFER;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 6744257500     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (30)

1. W. Worth, "Total Perfluorocompound (PFC) Emissions Data Report," SEMATECH Report 96073156B-ENG, Dec. 31, 1997.
2. See http://www.ipcc.ch/pub/techrep.htm
3. "Inventory of US Greenhouse Gas Emissions and Sinks," US Environmental Protection Agency, 1990-1998. See: www.epa.gov/ globalwarming/publications/emissions/us200 0/index.html
4. D. Cowles, "Oxide Etch Tool Emissions Comparison for C5F8 and C4F8 Process Recipes," A Partnership for PFC Emissions Reductions, SEMICON Southwest, Austin, Texas, Oct. 18, 1999.
5. International Technology Roadmap for Semiconductors, 1999 Edition, p. 248.
6. See www.eeca.org/pdf/pfc_emis pdf
7. L. Beu, W. Worth, "A Review of PFC Emissions Reporting Methodologies and Suggestions for Improvements," A Partnership for PFC Emissions Reductions, SEMICON Southwest, Austin, Texas, Oct. 13, 1997.
8. See www.idg.net/crd_council_76214.html
9. Dataquest, "Year end 1998 Forecast; Capital Sending in the Wafer Fab Equipment and Silicon Markets," Report SEMM-WW-MT-9901, March 8, 1999.
10. L. Beu, P.T. Broun, "An Analysis of Fluorinated Compound Emissions Reduction Technologies and Emission Reduction Goals," Semiconductor Fabtech, 11th Edition (Spring 2000), p. 91.
11. J. McNabb, "C2F6 Recipe Optimization at Hewlett Packard," A Partnership for PFC Emissions Reductions, SEMICON Southwest, Austin, Texas, Oct. 13, 1997.
12. A. Doe, J. Maille, G. Hills, R. Ridgeway, T. Strencosky, "Empirical Modeling of Emissions from Dielectric Etch Reactors for the Assessment of their Environmental Impact," Environmental Impact of Process Tools, SEMICON West, July 12, 1999.
13. Y. Yoshida, Japan's "Research on Alternative Etching Gases," Global Semiconductor Industry Conference on Perfluorocompound Emissions Control, Monterey, Calif., April 7, 1998.
14. S. Karecki, L. Pruette, R. Reif, "Development of Alternative Chemistries for Wafer Patterning and PECVD Chamber Cleaning Applications," Global Semiconductor Industry Conference on Perfluorocompound Emissions Control, Monterey, Calif., April 7, 1998.
15. W. Worth, "Tool Perfluorocompound (PFC) Emissions Data Report," SEMATECH Technology Transfer 96073156B-ENC, Dec. 31, 1997.
16. A. Cheng, M. Daniels, "Evaluation of C3F8 and TFAA as Chamber Cleaning Gases in an Applied Materials 5200 TEOS Deposition Tool," SEMATECH Report 98063537A-ENG, July 31, 1998.
17. T. Tamayo, "IBM's Success with Process Optimization and Beyond," Global Semiconductor Industry Conference on Perfluorocompound Emissions Control, Monterey, Calif., April 8, 1998.
18. K. Aitchison, "Simultaneous Resolution of Multiple Environmental Issues: The Development of In-Situ RF Plasma Chamber Clean Processes Using Dilute NF3He Mixtures," Semiconductor Fabtech, 11th Edition (Spring 2000), p 87
19. L. Mendicino, S, Filipiak, P.T. Brown, J. Langan, R. Ridgeway, A Johnson, R. Pearce, P. Maroulis, A. Atherton, "Evaluation of the Applied Materials μClean Technology for DxZ Chamber Clean for Perfluorocompound (PFC) Emissions Reduction," SEMATECH Report 98083547A-TR, Aug. 31, 1998.
20. L. Mendicino, P.T Brown, S Filipiak, L. Beu, A. Johnson, R. Pearce, P. Maroulis, R. Basnett, W. Holber, "Motorola Evaluation of the Applied Science and Technology Inc. (ASTeX) ASTRON Technology for Perfiuorocompound (PFC) Emissions Reductions on the Applied Materials DxL Chemical Vapor Deposition (CVD) Chamber," SEMATECH Report 99033697A-TR, April 16, 1999.
21. W. Carson, K. Christian, E. Crossland, T. Hsiung, R. Ridgeway, J. Yang, "Large Scale PFC Caputure System, A Partnership for PFC Emissions Reduction," SEMICON Southwest, Austin, Texas, Oct. 13, 1997.
22. W. Cummins, T. Gilliland, S. Kesari, D. Miner, C. Fleming, K. Trilli, "The Future of Perfluorocarbon Capture and Recycling: Membrane Technology," Semiconductor International, Vol 20, #8, July 1997, p. 265.
23. T. Gilliland, C. Hoover, "Evaluation of Praxair's Perfluorocompound (PFC) Capture/Recovery System," SEMATECH Report 98113600A-ENG, Dec. 21, 1998.
24. T. Gilliland, A. Seeley, "Edwards Perfluorocompound Recovery at Texas Instruments," A Partnership for PFC Emissions Reduction, SEMICON Southwest, Austin, Texas, Oct. 13, 1997.
25. M. Mocella, "PFC Recovery: Issues, Technologics and Considerations for Post-Recovery Processing," Global Semiconductor Industry Conference on Perfluorocompound Emissions Control, Montercy, Calif., April 7, 1998.
26. T. Walling, A. Tran, R, Ridgeway, "Evaluation of an Edwards TPU 4214 and an Ecosys Phoenix IV for CF4 Abatement (ESJC002)," SEMATECH Technology Transfer 97073319A-TR, Sept. 30, 1997.
27. J. Van Gompel, T. Walling, "A New Way to Treat Process Exhaust to Remove CF4," Semiconductor International, Vol 20 (#10), September 1997, p. 95.
28. J. Van Gompel, V. Chidgopkar,"Reducing Water Use in Exhaust Management Systems," Micro, Vol 17 (#7), July/August 1999, p. 67.
29. S. Tamata, "Catalytic Destruction of PFCs," Global Semiconductor Industry Conference on Perfluorocompound Emissions Control, Monterey, Calif., April 8, 1998.
30. V. Vartanian, L. Ben, T. Stephens, J. Rivers, B. Perez, E. Tonnis, M. Kiehlbauch, D. Graves, "Long-Term Evaluation of the Litmas 'Blue' Plasma Device for Point-of-Use (POU) Perfluorocompound and Hydrofluorocarbon Abatement," SEMATECH Report 99123865A-ENG, Jan. 7, 2000.