Evaluation of a dilute nitrogen trifluoride plasma clean in a dielectric PECVD reactor

Electrochemical and Solid-State Letters

Volumn 2, Issue 11, 1999, Pages 592-594

  Pruette, L ^a   Karecki, S ^a   Reif, R ^a   Entley, W ^b   Langan, J ^b   Hazari, V ^c   Hines, C ^d  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b AIR PRODUCTS AND CHEMICALS INC   (United States)

^c Novellus Systems   (United States)

^d IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

GLOBAL WARMING; NITROGEN COMPOUNDS; PLASMA DEVICES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

DILUTE NITROGEN TRIFLUORIDE PLASMA CLEAN;

CHEMICAL CLEANING;

EID: 0033335749     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1390916     Document Type: Article

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