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Volumn 147, Issue 3, 2000, Pages 1149-1153

Evaluation of C4F8O as an alternative plasma-enhanced chemical vapor deposition chamber clean chemistry

Author keywords

[No Author keywords available]

Indexed keywords

CLEANING; COMPUTER SIMULATION; FLUORINE CONTAINING POLYMERS; GAS EMISSIONS; GLOBAL WARMING; NEURAL NETWORKS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0033893414     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1393328     Document Type: Article
Times cited : (30)

References (13)
  • 7
    • 0342529808 scopus 로고    scopus 로고
    • Environmental issues in the electronics and semiconductor industries
    • L. Mendicino and L. Simpson, Editors, PV 99-8, Pennington, NJ
    • L. Mendicino, P. Brown, S. Filipak, and D. Loop, in Environmental Issues in the Electronics and Semiconductor Industries, L. Mendicino and L. Simpson, Editors, PV 99-8, p. 40, The Electrochemical Society Proceedings Series, Pennington, NJ (1999).
    • (1999) The Electrochemical Society Proceedings Series , pp. 40
    • Mendicino, L.1    Brown, P.2    Filipak, S.3    Loop, D.4
  • 8
    • 0343835056 scopus 로고    scopus 로고
    • J. J. Houghton, L. G. Meiro Philo, B. A. Callander, N. Harris, A. Kattenberg, and K. Maskell, Editors, Cambridge University Press, U.K.
    • Intergovernmental Panel on Climate Change, The Science of Climate Change 1995, J. J. Houghton, L. G. Meiro Philo, B. A. Callander, N. Harris, A. Kattenberg, and K. Maskell, Editors, p. 16, Cambridge University Press, U.K. (1996).
    • (1996) The Science of Climate Change 1995 , pp. 16
  • 13


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.