Ion energy distributions and optical emission spectra in NF3-based process chamber cleaning plasmas

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 4, 2001, Pages 1346-1357

  Hsueh, Hsin Pai ^a   McGrath, Robert T ^a   Ji, Bing ^b   Felker, Brian S ^b   Langan, John G ^b,c   Karwacki, Eugene J ^b  

^a PENNSYLVANIA STATE UNIVERSITY   (United States)

^b AIR PRODUCTS AND CHEMICALS INC   (United States)

^c NOVELLUS SYSTEMS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; COMPOSITION EFFECTS; EMISSION SPECTROSCOPY; HELIUM; ION BOMBARDMENT; LIGHT EMISSION; MASS SPECTROMETRY; OPTIMIZATION; OXYGEN; PLASMA APPLICATIONS; PRESSURE EFFECTS; SEMICONDUCTOR PLASMAS;

DILUENTS; ETCH RATE; ION ENERGY ANALYSIS; ION ENERGY DISTRIBUTION; OPTICAL EMISSION SPECTRA; PLASMA ION MASS SPECTROMETRY;

FLUOROCARBONS;

EID: 0035535266     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1379794     Document Type: Conference Paper

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