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Volumn 86, Issue 9, 1999, Pages 4825-4835

Optimizing utilization efficiencies in electronegative discharges: The importance of the impedance phase angle

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0000395487     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371449     Document Type: Article
Times cited : (18)

References (47)
  • 18
    • 85034534060 scopus 로고    scopus 로고
    • note
    • The identification of commercial materials and their sources is made to describe the experiment adequately. In no case does this identification imply recommendation by the National Institute of Standards and Technology nor does it imply that the instrument is the best available.
  • 23
    • 85034543232 scopus 로고    scopus 로고
    • note
    • 2 are equal. It is also assumed that the rfON and rfOFF mass spectra were acquired under identical conditions (i.e., identical amplifier sensitivity, electron multiplier voltage, and mass spectrometer temperature).
  • 24
    • 85034548320 scopus 로고    scopus 로고
    • note
    • 6 calibration curve. Both calibration curves were obtained under identical conditions (i.e., identical amplifier sensitivity, electron multiplier voltage, and mass spectrometer temperature) in the absence of a plasma.
  • 32
    • 3242855656 scopus 로고
    • edited by H. S. W. Massey, E. W. McDaniel, and B. Bederson Academic, New York, Chap. 2
    • P. J. Chantry, in Applied Atomic Collision Physics, edited by H. S. W. Massey, E. W. McDaniel, and B. Bederson (Academic, New York, 1982), Vol. 3, Chap. 2, pp. 57-59.
    • (1982) Applied Atomic Collision Physics , vol.3 , pp. 57-59
    • Chantry, P.J.1
  • 33
    • 0023536434 scopus 로고
    • edited by G. S. Mathad, G. C. Schwartz, and R. A. Gottscho Electrochemical Society, Pennington, NJ
    • R. A. Gottscho and G. Scheller, Proceedings of the Sixth Symposium on Plasma Processing, edited by G. S. Mathad, G. C. Schwartz, and R. A. Gottscho (Electrochemical Society, Pennington, NJ, 1987), Vol. 87-6, p. 201.
    • (1987) Proceedings of the Sixth Symposium on Plasma Processing , vol.6-87 , pp. 201
    • Gottscho, R.A.1    Scheller, G.2
  • 37
    • 1242313305 scopus 로고
    • edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood Noyes, Park Ridge, NJ
    • G. Oehrlien, in Handbook of Plasma Processing Technology, edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood (Noyes, Park Ridge, NJ, 1990), p. 209.
    • (1990) Handbook of Plasma Processing Technology , pp. 209
    • Oehrlien, G.1
  • 38
    • 3242818591 scopus 로고
    • edited by D. M. Manos and D. L. Flamm Academic, New York, Chap. 2
    • D. L. Flamm, in Plasma Etching: An Introduction, edited by D. M. Manos and D. L. Flamm (Academic, New York, 1989), Chap. 2, p. 125.
    • (1989) Plasma Etching: An Introduction , pp. 125
    • Flamm, D.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.