-
2
-
-
0025625916
-
-
J. Perrin, J. Meot, J.-M. Siefert, and J. Schmitt, Plasma Chem. Plasma Process. 10, 571 (1990).
-
(1990)
Plasma Chem. Plasma Process.
, vol.10
, pp. 571
-
-
Perrin, J.1
Meot, J.2
Siefert, J.-M.3
Schmitt, J.4
-
3
-
-
0030150633
-
-
K. Ino, I. Natori, A. Ichikawa, R. N. Vrtis, and T. Ohmi, IEEE Trans. Semicond. Manuf. 9, 230 (1996).
-
(1996)
IEEE Trans. Semicond. Manuf.
, vol.9
, pp. 230
-
-
Ino, K.1
Natori, I.2
Ichikawa, A.3
Vrtis, R.N.4
Ohmi, T.5
-
4
-
-
84881173674
-
-
G. Bruno, P. Capezzuto, G. Cicala, and P. Manodoro, J. Vac. Sci. Technol. A 12, 690 (1994).
-
(1994)
J. Vac. Sci. Technol. A
, vol.12
, pp. 690
-
-
Bruno, G.1
Capezzuto, P.2
Cicala, G.3
Manodoro, P.4
-
5
-
-
0002337308
-
-
edited by I. Solomon, B. Equer, and P. Helm Kluwer Academic, Dordrecht
-
J. P. M. Schmitt, J. Meot, P. Ronbeau, and P. Porrens, Proceedings of the Eighth European Community Photovoltalic Solar Energy Conference, Florence, edited by I. Solomon, B. Equer, and P. Helm (Kluwer Academic, Dordrecht, 1988), p. 964.
-
(1988)
Proceedings of the Eighth European Community Photovoltalic Solar Energy Conference, Florence
, pp. 964
-
-
Schmitt, J.P.M.1
Meot, J.2
Ronbeau, P.3
Porrens, P.4
-
6
-
-
0031224075
-
-
K. Koike, T. Fukuda, S. Fujikawa, and M. Saeda, Jpn. J. Appl. Phys., Part 1 36, 5724 (1997).
-
(1997)
Jpn. J. Appl. Phys., Part 1
, vol.36
, pp. 5724
-
-
Koike, K.1
Fukuda, T.2
Fujikawa, S.3
Saeda, M.4
-
7
-
-
0000068306
-
-
P. Maroulis, J. Langan, A. Johnson, R. Ridgeway, and H. Withers, Semicond. Int. 17, 107 (1994).
-
(1994)
Semicond. Int.
, vol.17
, pp. 107
-
-
Maroulis, P.1
Langan, J.2
Johnson, A.3
Ridgeway, R.4
Withers, H.5
-
8
-
-
0342551496
-
-
B. Anderson, J. Behnke, M. Berman, H. Kobeissi, B. Huling, J. Langan, S.-Y. Lynn, and R. Morgan, Semicond. Int. 16, 86 (1993).
-
(1993)
Semicond. Int.
, vol.16
, pp. 86
-
-
Anderson, B.1
Behnke, J.2
Berman, M.3
Kobeissi, H.4
Huling, B.5
Langan, J.6
Lynn, S.-Y.7
Morgan, R.8
-
9
-
-
36449001969
-
-
P. J. Hargis, Jr., K. E. Greenberg, P. A. Miller, J. B. Gerardo, J. R. Torczynski, M. E. Riley, G. A. Hebner, J. R. Roberts, J. K. Olthoff, J. R. Whetstone, R. J. Van Brunt, M. A. Sobolewski, H. M. Anderson, M. P. Splichal, J. L. Mock, P. Bletzinger, A. Garscadden, R. A. Gottscho, G. Selwyn, M. Dalvie, J. E. Heidenreich, J. W. Butterbaugh, M. L. Brake, M. L. Passow, J. Pender, A. Lujan, M. E. Elta, D. B. Graves, H. H. Sawin, M. J. Kushner, J. T. Verdeyen, R. Horwath, and T. R. Turner, Rev. Sci. Instrum. 65, 140 (1994).
-
(1994)
Rev. Sci. Instrum.
, vol.65
, pp. 140
-
-
Hargis Jr., P.J.1
Greenberg, K.E.2
Miller, P.A.3
Gerardo, J.B.4
Torczynski, J.R.5
Riley, M.E.6
Hebner, G.A.7
Roberts, J.R.8
Olthoff, J.K.9
Whetstone, J.R.10
Van Brunt, R.J.11
Sobolewski, M.A.12
Anderson, H.M.13
Splichal, M.P.14
Mock, J.L.15
Bletzinger, P.16
Garscadden, A.17
Gottscho, R.A.18
Selwyn, G.19
Dalvie, M.20
Heidenreich, J.E.21
Butterbaugh, J.W.22
Brake, M.L.23
Passow, M.L.24
Pender, J.25
Lujan, A.26
Elta, M.E.27
Graves, D.B.28
Sawin, H.H.29
Kushner, M.J.30
Verdeyen, J.T.31
Horwath, R.32
Turner, T.R.33
more..
-
10
-
-
0032329146
-
-
J. G. Langan, S. W. Rynders, B. S. Felker, and S. E. Beck, J. Vac. Sci. Technol. A 16, 2108 (1998).
-
(1998)
J. Vac. Sci. Technol. A
, vol.16
, pp. 2108
-
-
Langan, J.G.1
Rynders, S.W.2
Felker, B.S.3
Beck, S.E.4
-
11
-
-
0001461383
-
-
J. G. Langan, S. E. Beck, B. S. Felker, and S. W. Rynders, J. Appl. Phys. 79, 3886 (1996).
-
(1996)
J. Appl. Phys.
, vol.79
, pp. 3886
-
-
Langan, J.G.1
Beck, S.E.2
Felker, B.S.3
Rynders, S.W.4
-
13
-
-
0032075155
-
-
H. Kawata, T. Kubo, M. Yasuda, and K. Murata, J. Electrochem. Soc. 145, 1701 (1998).
-
(1998)
J. Electrochem. Soc.
, vol.145
, pp. 1701
-
-
Kawata, H.1
Kubo, T.2
Yasuda, M.3
Murata, K.4
-
16
-
-
3242863362
-
-
edited by G. S. Mathad and D. W. Hess Electrochemical Society, Pennington, NJ
-
H. Shan, J. P. McVittie, and S. A. Self, Proceedings of the Eight Symposium on Plasma Processing, edited by G. S. Mathad and D. W. Hess (Electrochemical Society, Pennington, NJ, 1990), Vol. 90-14, p. 229.
-
(1990)
Proceedings of the Eight Symposium on Plasma Processing
, vol.90
, Issue.14
, pp. 229
-
-
Shan, H.1
McVittie, J.P.2
Self, S.A.3
-
17
-
-
0031537647
-
-
Y. T. Lee, M. A. Lieberman, A. J. Lichtenberg, F. Bose, H. Baltes, and R. Patrick, J. Vac. Sci. Technol. A 15, 113 (1997).
-
(1997)
J. Vac. Sci. Technol. A
, vol.15
, pp. 113
-
-
Lee, Y.T.1
Lieberman, M.A.2
Lichtenberg, A.J.3
Bose, F.4
Baltes, H.5
Patrick, R.6
-
18
-
-
85034534060
-
-
note
-
The identification of commercial materials and their sources is made to describe the experiment adequately. In no case does this identification imply recommendation by the National Institute of Standards and Technology nor does it imply that the instrument is the best available.
-
-
-
-
21
-
-
85034533307
-
-
SEMATECH, Austin, TX
-
4) Process Quartzware Using a Thermal Nitrogen Trifluoride Etch Process: Technology Transfer No. 96083161A-TR; SEMATECH, Austin, TX, 1996.
-
(1996)
4) Process Quartzware Using a Thermal Nitrogen Trifluoride Etch Process: Technology Transfer No. 96083161A-TR
-
-
Johnson, A.1
Pearce, R.V.2
Schneider, C.A.3
McGaughey, T.W.4
Gibson, R.J.5
Metteer, B.L.6
Groves, R.F.7
-
23
-
-
85034543232
-
-
note
-
2 are equal. It is also assumed that the rfON and rfOFF mass spectra were acquired under identical conditions (i.e., identical amplifier sensitivity, electron multiplier voltage, and mass spectrometer temperature).
-
-
-
-
24
-
-
85034548320
-
-
note
-
6 calibration curve. Both calibration curves were obtained under identical conditions (i.e., identical amplifier sensitivity, electron multiplier voltage, and mass spectrometer temperature) in the absence of a plasma.
-
-
-
-
26
-
-
0031176742
-
-
T. Hayashi, A. Kono, and T. Goto, Jpn. J. Appl. Phys., Part 1 36, 4651 (1997).
-
(1997)
Jpn. J. Appl. Phys., Part 1
, vol.36
, pp. 4651
-
-
Hayashi, T.1
Kono, A.2
Goto, T.3
-
32
-
-
3242855656
-
-
edited by H. S. W. Massey, E. W. McDaniel, and B. Bederson Academic, New York, Chap. 2
-
P. J. Chantry, in Applied Atomic Collision Physics, edited by H. S. W. Massey, E. W. McDaniel, and B. Bederson (Academic, New York, 1982), Vol. 3, Chap. 2, pp. 57-59.
-
(1982)
Applied Atomic Collision Physics
, vol.3
, pp. 57-59
-
-
Chantry, P.J.1
-
33
-
-
0023536434
-
-
edited by G. S. Mathad, G. C. Schwartz, and R. A. Gottscho Electrochemical Society, Pennington, NJ
-
R. A. Gottscho and G. Scheller, Proceedings of the Sixth Symposium on Plasma Processing, edited by G. S. Mathad, G. C. Schwartz, and R. A. Gottscho (Electrochemical Society, Pennington, NJ, 1987), Vol. 87-6, p. 201.
-
(1987)
Proceedings of the Sixth Symposium on Plasma Processing
, vol.6-87
, pp. 201
-
-
Gottscho, R.A.1
Scheller, G.2
-
34
-
-
0000451675
-
-
T. M. Miller, J. F. Friedman, A. E. Stevens Miller, and J. F. Paulson, J. Phys. Chem. 98, 6144 (1994).
-
(1994)
J. Phys. Chem.
, vol.98
, pp. 6144
-
-
Miller, T.M.1
Friedman, J.F.2
Stevens Miller, A.E.3
Paulson, J.F.4
-
35
-
-
36549103848
-
-
G. R. Scheller, R. A. Gottscho, T. Intrator, and D. B. Graves. J. Appl. Phys. 64, 4384 (1998).
-
(1998)
J. Appl. Phys.
, vol.64
, pp. 4384
-
-
Scheller, G.R.1
Gottscho, R.A.2
Intrator, T.3
Graves, D.B.4
-
36
-
-
36749108637
-
-
3 based plasma; M. L. Dlabal, S. B. Hutchinson, J. G. Eden, and J. T. Verdeyen, Appl. Phys. Lett. 37, 873 (1980).
-
(1980)
Appl. Phys. Lett.
, vol.37
, pp. 873
-
-
Dlabal, M.L.1
Hutchinson, S.B.2
Eden, J.G.3
Verdeyen, J.T.4
-
37
-
-
1242313305
-
-
edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood Noyes, Park Ridge, NJ
-
G. Oehrlien, in Handbook of Plasma Processing Technology, edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood (Noyes, Park Ridge, NJ, 1990), p. 209.
-
(1990)
Handbook of Plasma Processing Technology
, pp. 209
-
-
Oehrlien, G.1
-
38
-
-
3242818591
-
-
edited by D. M. Manos and D. L. Flamm Academic, New York, Chap. 2
-
D. L. Flamm, in Plasma Etching: An Introduction, edited by D. M. Manos and D. L. Flamm (Academic, New York, 1989), Chap. 2, p. 125.
-
(1989)
Plasma Etching: An Introduction
, pp. 125
-
-
Flamm, D.L.1
-
40
-
-
0000468093
-
-
edited by L. G. Christophorou Academic, New York, Chap. 6
-
L. G. Christophorou, D. L. McCorkle, and A. A. Christodoulides, in Electron-Molecule Interactions and their applications, edited by L. G. Christophorou (Academic, New York, 1984), Vol. 1, Chap. 6.
-
(1984)
Electron-Molecule Interactions and Their Applications
, vol.1
-
-
Christophorou, L.G.1
McCorkle, D.L.2
Christodoulides, A.A.3
-
47
-
-
0020140106
-
-
H. Kawata, T. Shibano, K. Murata, and K. Nagami, J. Electrochem. Soc. 129, 1325 (1982).
-
(1982)
J. Electrochem. Soc.
, vol.129
, pp. 1325
-
-
Kawata, H.1
Shibano, T.2
Murata, K.3
Nagami, K.4
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