Surface chemical changes of aluminum during NF 3-based plasma processing used for in situ chamber cleaning

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 1, 2004, Pages 158-164

  Li, Xi ^a   Hua, Xuefeng ^a   Ling, Li ^a   Oehrlein, Gottlieb S ^a   Karwacki, E ^b   Ji, Bing ^b  

^a UNIVERSITY OF MARYLAND   (United States)

^b AIR PRODUCTS AND CHEMICALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

MICROWAVE EXCITED DISCHARGES; REAL-TIME ELLIPSOMETRY;

ALUMINUM; CONTAMINATION; ELLIPSOMETRY; ION BOMBARDMENT; MASS SPECTROMETRY; PLASMA THEORY; SPUTTER DEPOSITION; SURFACE CHEMISTRY; X RAY PHOTOELECTRON SPECTROSCOPY;

DIELECTRIC FILMS;

EID: 1242329418     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1633566     Document Type: Article

References (12)

1. J. G. Langan, P. Maroulis, and R. Ridgeway, Solid State Technol. 39, 115 (1996).
2. W. R. Entley, J. G. Langan, B. S. Felker, and M. A. Sobolewski, J. Appl. Phys. 86, 4825 (1999).
3. H.-P. Hsueh, R. T. MCGrath, B. Ji, B. S. Felker, J. G. Langan, and E. J. Karwacki, J. Vac. Sci. Technol. B 19, 1346 (2001).
4. J. G. Langan, S. E. Beck, B. S. Felker, and S. W. Rynders, J. Appl. Phys. 79, 3886 (1996).
5. G. S. Oehrlein, in Handbook of Plasma Processing Technology, edited by S. M. Rossnage, J. J. Cuomo, and W. D. Westwood (Noyes, Park Ridge, 1 NJ, 1990), p. 209.
6. B. E. E. Kastenmeier, G. S. Oehrlein, J. G. Langan, and W. Entley, J. Vac. Sci. Technol. A 18, 2102 (2000).
7. R. M. A. Azzam and N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1997).
8. G. S. Oehrlein, in Remote Plasma Processing, Plasma Processing of Semiconductors, NATO ASI Series Vol. 336 edited by P. F. Williams (Kluwer Academic, Dordrecht 1997), p. 477.
9. M. Haverlag, D. Vender, and G. S. Oehrlein, Appl. Phys. Lett. 61, 2875 (1992).
10. G. S. Oehrlein, J. Vac. Sci. Technol. A 11, 34 (1993).
11. J. G. Langan, S. W. Rynders, B. S. Felker, and S. E. Beck, J. Vac. Sci. Technol. A 16, 2108 (1998).
12. M. A. Sobolewski, J. G. Langan, and B. S. Felker, J. Vac. Sci. Technol. B 16, 173 (1998).