Infrared study of process emissions during C3F8/O2 plasma cleaning of plasma enhanced chemical vapor deposition chambers

Journal of the Electrochemical Society

Volumn 144, Issue 10, 1997, Pages 3597-3601

  Zazzera, Larry ^a   Reagen, William ^a   Cheng, Albert ^a  

^a 3M COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GAS EMISSIONS; PLASMA APPLICATIONS; POLLUTION CONTROL;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION CHAMBER;

FLUORINE COMPOUNDS;

EID: 0031249250     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838054     Document Type: Article

References (11)