Ion implantation induced phase transformation in carbon and boron nitride thin films

Diamond and Related Materials

Volumn 14, Issue 8, 2005, Pages 1395-1401

  Oates, T W H ^a   Ryves, L ^b   Burgmann, F A ^c   Abendroth, B ^a   Bilek, M M M ^b   McKenzie, D R ^b   McCulloch, D G ^c  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b UNIVERSITY OF SYDNEY   (Australia)

^c RMIT UNIVERSITY   (Australia)

Author keywords

Ellipsometry; Ion implantation; Stress

Indexed keywords

CUBIC BORON NITRIDE; ELASTIC MODULI; ELECTRON ENERGY LOSS SPECTROSCOPY; ELLIPSOMETRY; ION IMPLANTATION; MAGNETRON SPUTTERING; PHASE TRANSITIONS;

AMORPHOUS CARBON; HIGH ENERGY ION BOMBARDMENT; NANO-SCALE SUBSURFACE REGIONS;

THIN FILMS;

EID: 22844436190     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2005.02.004     Document Type: Conference Paper

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