Characterization of structure and role of different textures in polycrystalline Si films

Journal of Non-Crystalline Solids

Volumn 351, Issue 24-26, 2005, Pages 2107-2114

  Adel, A Haddad ^a   Inokuma, T ^a   Kurata, Y ^a   Hasegawa, S ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CRYSTAL ORIENTATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; SUBSTRATES; SURFACES; SYNTHESIS (CHEMICAL); TEXTURES;

DEPOSITION RATES; GRAIN ORIENTATION; PREFERENTIAL ORIENTATION; PRETREATMENT;

POLYCRYSTALLINE MATERIALS;

EID: 21444434253     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2005.05.007     Document Type: Article

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