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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 11, 1997, Pages 6625-6632

Effects of the addition of SiF4 to the SiH4 feed gas for depositing polycrystalline silicon films at low temperature

(4) Syed, Moniruzzaman a Inokuma, Takao a Kurata, Yoshihiro a Hasegawa, Seiichi a

a KANAZAWA UNIVERSITY (Japan)

Author keywords

Polycrystalline silicon; Surface morphology; Surface roughness; Thin film

Indexed keywords

CHEMICAL CLEANING; CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; CRYSTAL ORIENTATION; GRAIN SIZE AND SHAPE; MORPHOLOGY; PLASMA APPLICATIONS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; SILANES; SURFACE ROUGHNESS; THIN FILMS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); SILICON TETRAFLUORIDE; SURFACE MIGRATION;

SEMICONDUCTING FILMS;

EID: 0031274125 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.36.6625 Document Type: Article

Times cited : (14)

References (26)

1
- 0023238277
- N. Shibata, K. Fukuda, H. Ohtoshi, J. Hanna, S. Oda and I. Shimizu: Jpn. J. Appl. Phys. 26 (1987) L10.
- (1987) Jpn. J. Appl. Phys. , vol.26
- Shibata, N.¹ Fukuda, K.² Ohtoshi, H.³ Hanna, J.⁴ Oda, S.⁵ Shimizu, I.⁶

2
- 0041628595
- J. Hanna, A. Kamo, M. Azuma, N. Shibata, H. Shirai and I. Shimizu: Mater. Res. Soc. Symp. Proc. 118 (1988) 79.
- (1988) Mater. Res. Soc. Symp. Proc. , vol.118 , pp. 79
- Hanna, J.¹ Kamo, A.² Azuma, M.³ Shibata, N.⁴ Shirai, H.⁵ Shimizu, I.⁶

3
- 0024779484
- H. Shirai, H. Tanabe, T. Uematu, J. Hanna and I. Shimizu: J. Non-Cryst. Solid 114 (1989) 810.
- (1989) J. Non-Cryst. Solid , vol.114 , pp. 810
- Shirai, H.¹ Tanabe, H.² Uematu, T.³ Hanna, J.⁴ Shimizu, I.⁵

4
- 0026157717
- M. Mohri, H. Kakinuma, M. Sakamoto and H. Sawai: Jpn. J. Appl. Phys. 30 (1991) L779.
- (1991) Jpn. J. Appl. Phys. , vol.30
- Mohri, M.¹ Kakinuma, H.² Sakamoto, M.³ Sawai, H.⁴

5
- 21544472972
- H. Kakinuma, M. Mohri, M. Sakamoto and T. Tsuruoka: J. Appl. Phys. 70 (1991) 7374.
- (1991) J. Appl. Phys. , vol.70 , pp. 7374
- Kakinuma, H.¹ Mohri, M.² Sakamoto, M.³ Tsuruoka, T.⁴

6
- 0027002140
- T. Nagahara, K. Fujimoto, N. Kono, Y. Kashiwagi and H. Kakinoki: Jpn. J. Appl. Phys. 31 (1992) 4555.
- (1992) Jpn. J. Appl. Phys. , vol.31 , pp. 4555
- Nagahara, T.¹ Fujimoto, K.² Kono, N.³ Kashiwagi, Y.⁴ Kakinoki, H.⁵

7
- 0000023121
- S. K. Kim, K. C. Park and J. Jang: J. Appl. Phys. 77 (1995) 5115.
- (1995) J. Appl. Phys. , vol.77 , pp. 5115
- Kim, S.K.¹ Park, K.C.² Jang, J.³

8
- 36149037913
- S. Veprek, Z. Iqbal, H. R. Oswald and A. P. Webb: J. Phys. C 14 (1981) 295.
- (1981) J. Phys. C , vol.14 , pp. 295
- Veprek, S.¹ Iqbal, Z.² Oswald, H.R.³ Webb, A.P.⁴

9
- 0024795078
- Y. Okada, J. Chen, I. H. Campbell, P. M. Fauchet and S. Wagner: J. Non-Cryst. Solids 114 (1989) 816.
- (1989) J. Non-Cryst. Solids , vol.114 , pp. 816
- Okada, Y.¹ Chen, J.² Campbell, I.H.³ Fauchet, P.M.⁴ Wagner, S.⁵

10
- 0024781441
- C. C. Tsai, G. B. Anderson, R. Thompson and B. Wacker: J. Non-Cryst. Solids 114 (1989) 151.
- (1989) J. Non-Cryst. Solids , vol.114 , pp. 151
- Tsai, C.C.¹ Anderson, G.B.² Thompson, R.³ Wacker, B.⁴

11
- 0025521838
- S. Hasegawa, S. Yamamoto and Y. Kurata: J. Electrochem. Soc. 137 (1990) 3666.
- (1990) J. Electrochem. Soc. , vol.137 , pp. 3666
- Hasegawa, S.¹ Yamamoto, S.² Kurata, Y.³

12
- 0001529245
- S. C. Kim, H. H. Jung and J. Jang: Appl. Phys. Lett. 58 (1991) 281.
- (1991) Appl. Phys. Lett. , vol.58 , pp. 281
- Kim, S.C.¹ Jung, H.H.² Jang, J.³

13
- 36549104118
- B. S. Meyerson, F. Himpsel and K. Uram: Appl. Phys. Lett. 57 (1990) 1034.
- (1990) Appl. Phys. Lett. , vol.57 , pp. 1034
- Meyerson, B.S.¹ Himpsel, F.² Uram, K.³

14
- 0000123291
- Y. Z. Hu, C. Y. Zhao, C. Basa, W. X. Gao and E. A. Irene: Appl. Phys. Lett. 69 (1996) 485.
- (1996) Appl. Phys. Lett. , vol.69 , pp. 485
- Hu, Y.Z.¹ Zhao, C.Y.² Basa, C.³ Gao, W.X.⁴ Irene, E.A.⁵

15
- 0030232367
- T. Arai, T. Nakamura and H. Shirai: Jpn. J. Appl. Phys. 35 (1996) L1161.
- (1996) Jpn. J. Appl. Phys. , vol.35
- Arai, T.¹ Nakamura, T.² Shirai, H.³

16
- 0001614737
- M. Kondo, Y. Toyoshima and A. Matsuda: J. Appl. Phys. 80 (1996) 6061.
- (1996) J. Appl. Phys. , vol.80 , pp. 6061
- Kondo, M.¹ Toyoshima, Y.² Matsuda, A.³

17
- 0023363993
- K. Nagamine, A. Yamada, M. Konagai and K. Takahashi: Jpn. J. Appl. Phys. 26 (1987) L951.
- (1987) Jpn. J. Appl. Phys. , vol.26
- Nagamine, K.¹ Yamada, A.² Konagai, M.³ Takahashi, K.⁴

18
- 0001335287
- K. Baert, P. Deschepper, J. Nijs and R. Mertens: Appl. Phys. Lett. 60 (1992) 442.
- (1992) Appl. Phys. Lett. , vol.60 , pp. 442
- Baert, K.¹ Deschepper, P.² Nijs, J.³ Mertens, R.⁴

19
- 0020847834
- S. Hasegawa, S. Narikawa and Y. Kurata: Philos. Mag. B 48 (1983) 431.
- (1983) Philos. Mag. B , vol.48 , pp. 431
- Hasegawa, S.¹ Narikawa, S.² Kurata, Y.³

20
- 0001454821
- S. Hasegawa, E. Fujimoto, T. Inokuma and Y. Kurata: J. Appl. Phys. 77 (1995) 357.
- (1995) J. Appl. Phys. , vol.77 , pp. 357
- Hasegawa, S.¹ Fujimoto, E.² Inokuma, T.³ Kurata, Y.⁴

21
- 0000345863
- S. Hasegawa, S. Watanabe, T. Inokuma and Y. Kurata: J. Appl. Phys. 77 (1995) 1938.
- (1995) J. Appl. Phys. , vol.77 , pp. 1938
- Hasegawa, S.¹ Watanabe, S.² Inokuma, T.³ Kurata, Y.⁴

22
- 0000172317
- R. Tsu, G. Gonzalez-Hernandez, S. S. Chao, S. C. Lee and K. Tanaka: Appl. Phys. Lett. 40 (1982) 534.
- (1982) Appl. Phys. Lett. , vol.40 , pp. 534
- Tsu, R.¹ Gonzalez-Hernandez, G.² Chao, S.S.³ Lee, S.C.⁴ Tanaka, K.⁵

23
- 0000073841
- G. G. Stoney: Proc. R. Soc. London Ser. A 82 (1909) 172.
- (1909) Proc. R. Soc. London Ser. A , vol.82 , pp. 172
- Stoney, G.G.¹

24
- 0001374731
- S. Hasegawa, Y. Amano, T. Inokuma and Y. Kurata: J. Appl. Phys. 72 (1992) 5676.
- (1992) J. Appl. Phys. , vol.72 , pp. 5676
- Hasegawa, S.¹ Amano, Y.² Inokuma, T.³ Kurata, Y.⁴

25
- 0030126375
- Y.-B. Park and S.-W. Rhee: Appl. Phys. Lett. 68 (1996) 2219.
- (1996) Appl. Phys. Lett. , vol.68 , pp. 2219
- Park, Y.-B.¹ Rhee, S.-W.²

26
- 0014523646
- P. J. Burkhardt and R. F. Marvel: J. Electrochem. Soc. 116 (1969) 864.
- (1969) J. Electrochem. Soc. , vol.116 , pp. 864
- Burkhardt, P.J.¹ Marvel, R.F.²

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