Influence of the morphology of ferroelectric SrBi 2 Ta 2 O 9 thin films deposited by metal organic decomposition on its electrical characteristics

Applied Surface Science

Volumn 249, Issue 1-4, 2005, Pages 23-30

  Moert, M ^a   Schindler, G ^a   Mikolajick, T ^a   Nagel, N ^a   Hartner, W ^a   Dehm, C ^a   Kohlstedt, H ^b   Waser, R ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Ferroelectric; Hysteresis; Leakage current; Morphology; Phase transformation; SBT

Indexed keywords

ATOMIC FORCE MICROSCOPY; FERROELECTRIC MATERIALS; HYSTERESIS; LEAKAGE CURRENTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; PHASE TRANSITIONS; STRONTIUM COMPOUNDS; SURFACE ROUGHNESS; X RAY DIFFRACTION;

CRYSTAL PHASE; FERROELECTRIC RANDOM ACCESS MEMORY (FRAM); FILM GRANULARITY; SURFACE COVERAGE;

THIN FILMS;

EID: 21244457609     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.11.012     Document Type: Article

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