Scanning probe microscopy - a tool for the investigation of high-k materials

Applied Surface Science

Volumn 157, Issue 4, 2000, Pages 387-392

  Landau, S A ^a   Junghans, N ^a   Weiss P A ^a   Kolbesen, B O ^a   Olbrich, A ^b   Schindler, G ^b   Hartner, W ^b   Hintermaier, F ^b   Dehm, C ^b   Mazure C ^b  

^a GOETHE UNIVERSITY   (Germany)

^b INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; BARIUM COMPOUNDS; CMOS INTEGRATED CIRCUITS; CRYSTAL DEFECTS; LEAD COMPOUNDS; LEAKAGE CURRENTS; MORPHOLOGY; POLARIZATION; POLYCRYSTALLINE MATERIALS; STRONTIUM COMPOUNDS;

CONDUCTIVE ATOMIC FORCE MICROSCOPY (C-AFM); ELECTROSTATIC FORCE MICROSCOPY (EFM); SCANNING PROBE MICROSCOPY (SPM);

FERROELECTRIC MATERIALS;

EID: 0033734439     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(99)00555-3     Document Type: Article

References (10)

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