Effect of film thickness on structural and electrical properties of sputter-deposited nickle oxide films

Materials Transactions

Volumn 46, Issue 4, 2005, Pages 872-879

  Chen, Hao Long ^a   Lu, Yang Ming ^b   Hwang, Weng Sing ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b KUN SHAN UNIVERSITY   (Taiwan)

Author keywords

Electrical; Hall effect; Nickel oxide films; Structural; Thickness

Indexed keywords

ELECTRICAL; NICKEL OXIDE FILMS; STRUCTURAL; THICKNESS;

CARRIER CONCENTRATION; CARRIER MOBILITY; DISLOCATIONS (CRYSTALS); ELECTRIC CONDUCTIVITY; HALL EFFECT; MAGNETRON SPUTTERING; MICROSTRUCTURE; NICKEL COMPOUNDS; SPUTTER DEPOSITION; STACKING FAULTS; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

THIN FILMS;

EID: 20944437556     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.46.872     Document Type: Article

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