Preferred orientations of NiO thin films prepared by RF magnetron sputtering

Journal of Materials Science

Volumn 39, Issue 13, 2004, Pages 4375-4377

  Ryu, H W ^a   Choi, G P ^a   Lee, W S ^a   Park, J S ^a  

^a Chosun University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETIC MATERIALS; CRYSTAL ORIENTATION; CRYSTALLOGRAPHY; ELECTROCHROMIC DEVICES; ELECTRON BEAMS; EVAPORATION; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SUPERCONDUCTING FILMS; X RAY DIFFRACTION ANALYSIS;

BUFFER LAYERS; OXIDE FILMS; SPUTTERING GASES; TRANSPARENT CONDUCTING FILMS;

THIN FILMS;

EID: 3142755006     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:JMSC.0000033431.52659.e5     Document Type: Article

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