The influence of process parameters and annealing temperature on the physical properties of sputtered NiO thin films

Vacuum

Volumn 69, Issue 1-3, 2002, Pages 237-242

  Hotovy I ^a   Huran, J ^b   Spiess, L ^c   Liday, J ^a   Sitter, H ^d   Hascik S ^b  

^a SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

^b INSTITUTE OF ELECTRICAL ENGINEERING   (Slovakia)

^c ILMENAU UNIVERSITY OF TECHNOLOGY   (Germany)

^d JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

Author keywords

AFM; Gas sensors; Nickel oxide; Reactive magnetron sputtering; Structural properties; Surface morphology; Thin film; XRD

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CHEMICAL SENSORS; MAGNETRON SPUTTERING; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ALUMINA SUBSTRATES;

NICKEL COMPOUNDS;

EID: 0037168489     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00338-X     Document Type: Conference Paper

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