Surface-charge lithography for GaN microstructuring based on photoelectrochemical etching techniques

Applied Physics Letters

Volumn 86, Issue 17, 2005, Pages 1-3

  Tiginyanu, I M ^a   Popa, V ^a   Volciuc, O ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; ELECTROCHEMISTRY; ETCHING; GALLIUM NITRIDE; LIGHT EMITTING DIODES; MICROSTRUCTURE; PHOTOCHEMICAL REACTIONS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR LASERS; SEMICONDUCTOR MATERIALS;

MICROSTRUCTURING; PHOTOELECTROCHEMICAL ETCHING; SOLID STATE LIGHTING; SURFACE CHARGE LITHOGRAPHY;

LITHOGRAPHY;

EID: 20844446124     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1919393     Document Type: Article

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