메뉴 건너뛰기




Volumn 276, Issue 1-2, 2005, Pages 19-28

Epitaxial thickening of AIC poly-Si seed layers on glass by solid phase epitaxy

Author keywords

A1. Crystal structure; A3. Aluminium induced crystallisation; A3. Polycrystalline deposition; A3. Solid phase epitaxy; B2. Semiconducting silicon; B3. Solar cells

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLIZATION; EVAPORATION; GLASS; GRAIN SIZE AND SHAPE; LIGHT REFLECTION; LIGHT TRANSMISSION; POLYSILICON; SEMICONDUCTING SILICON; TRANSMISSION ELECTRON MICROSCOPY; ULTRAVIOLET SPECTROSCOPY;

EID: 20444379250     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.10.155     Document Type: Article
Times cited : (37)

References (29)
  • 1
    • 0000398235 scopus 로고    scopus 로고
    • A review of thin-film crystalline silicon for solar cell applications. Part 2: Foreign substrates
    • K.R. Catchpole, M.J. McCann, K.J. Weber, and A.W. Blakers A review of thin-film crystalline silicon for solar cell applications. Part 2 Foreign substrates Sol. Energy Mater. Sol. Cells 68 2001 173
    • (2001) Sol. Energy Mater. Sol. Cells , vol.68 , pp. 173
    • Catchpole, K.R.1    McCann, M.J.2    Weber, K.J.3    Blakers, A.W.4
  • 2
    • 79958195535 scopus 로고    scopus 로고
    • Flat panel imagers with pixel level amplifiers based on polycrystalline silicon thin-film transistor technology
    • J.P. Lu, K. Van Schuylenbergh, J. Ho, Y. Wang, J.B. Boyce, and R.A. Street Flat panel imagers with pixel level amplifiers based on polycrystalline silicon thin-film transistor technology Appl. Phys. Lett. 80 2002 4656
    • (2002) Appl. Phys. Lett. , vol.80 , pp. 4656
    • Lu, J.P.1    Van Schuylenbergh, K.2    Ho, J.3    Wang, Y.4    Boyce, J.B.5    Street, R.A.6
  • 4
    • 0032732931 scopus 로고    scopus 로고
    • Crystallization of a-Si:H on glass for active layers in thin film transistors - Effects of glass coating
    • Y.Z. Wang, S.J. Fonash, O.O. Awadelkarim, and T. Gu Crystallization of a-Si:H on glass for active layers in thin film transistors - effects of glass coating J. Electrochem. Soc. 146 1999 299
    • (1999) J. Electrochem. Soc. , vol.146 , pp. 299
    • Wang, Y.Z.1    Fonash, S.J.2    Awadelkarim, O.O.3    Gu, T.4
  • 5
    • 0036531549 scopus 로고    scopus 로고
    • CMOS polycrystalline silicon circuits on steel substrates
    • M. Wu, and S. Wagner CMOS polycrystalline silicon circuits on steel substrates J. Non-Cryst. Solids 299-302 2002 1316
    • (2002) J. Non-Cryst. Solids , vol.299-302 , pp. 1316
    • Wu, M.1    Wagner, S.2
  • 6
    • 0033337764 scopus 로고    scopus 로고
    • Polycrystalline silicon thin-films on glass by aluminium-induced crystallisation
    • O. Nast, S. Brehme, D.H. Neuhaus, and S.R. Wenham Polycrystalline silicon thin-films on glass by aluminium-induced crystallisation IEEE Trans. Electron. Dev. 46 1999 2062
    • (1999) IEEE Trans. Electron. Dev. , vol.46 , pp. 2062
    • Nast, O.1    Brehme, S.2    Neuhaus, D.H.3    Wenham, S.R.4
  • 7
    • 0001039356 scopus 로고    scopus 로고
    • Elucidation of the layer exchange mechanism in the formation of polycrystalline silicon by aluminium-induced crystallisation
    • O. Nast, and S.R. Wenham Elucidation of the layer exchange mechanism in the formation of polycrystalline silicon by aluminium-induced crystallisation J. App. Phy. 88 2000 124
    • (2000) J. App. Phy. , vol.88 , pp. 124
    • Nast, O.1    Wenham, S.R.2
  • 8
    • 0036645207 scopus 로고    scopus 로고
    • Surface morphology of poly-Si films made by aluminium-induced crystallisation on glass substrates
    • P.I. Widenborg, and A.G. Aberle Surface morphology of poly-Si films made by aluminium-induced crystallisation on glass substrates J. Crystal Growth 242 2002 270
    • (2002) J. Crystal Growth , vol.242 , pp. 270
    • Widenborg, P.I.1    Aberle, A.G.2
  • 12
    • 0035367486 scopus 로고    scopus 로고
    • Formation of large-grained uniform poly-Si films on glass at low temperature
    • A.G. Aberle, N.-P. Harder, and S. Oelting Formation of large-grained uniform poly-Si films on glass at low temperature J. Crystal Growth 226 2001 209
    • (2001) J. Crystal Growth , vol.226 , pp. 209
    • Aberle, A.G.1    Harder, N.-P.2    Oelting, S.3
  • 14
    • 17644437191 scopus 로고    scopus 로고
    • Aluminium-induced crystallization of amorphous silicon: Influence of material characteristics on the reaction
    • C. Ornaghi, G. Beaucarne, J. Poortmans, J. Nijs, and R. Mertens Aluminium-induced crystallization of amorphous silicon influence of material characteristics on the reaction Thin Solid Films 451-452 2004 476
    • (2004) Thin Solid Films , vol.451-452 , pp. 476
    • Ornaghi, C.1    Beaucarne, G.2    Poortmans, J.3    Nijs, J.4    Mertens, R.5
  • 15
    • 2442564874 scopus 로고    scopus 로고
    • Polycrystalline silicon thin film solar cells utilizing aluminium induced crystallization method
    • Y. Ishikawa, A. Nakamura, Y. Uraoka, and T. Fuyuki Polycrystalline silicon thin film solar cells utilizing aluminium induced crystallization method Jpn. J. Appl. Phys. 43 2004 877
    • (2004) Jpn. J. Appl. Phys. , vol.43 , pp. 877
    • Ishikawa, Y.1    Nakamura, A.2    Uraoka, Y.3    Fuyuki, T.4
  • 18
    • 0037932026 scopus 로고    scopus 로고
    • Fabrication of thin-film polycrystalline silicon solar cells by silane-gas-free process using aluminium-induced crystallization
    • T. Ito, H. Fukushima, and M. Yamaguchi Fabrication of thin-film polycrystalline silicon solar cells by silane-gas-free process using aluminium-induced crystallization Jpn. J. Appl. Phys. 42 2003 1526
    • (2003) Jpn. J. Appl. Phys. , vol.42 , pp. 1526
    • Ito, T.1    Fukushima, H.2    Yamaguchi, M.3
  • 19
    • 0024769312 scopus 로고
    • Present status of solid phase epitaxy of vacuum-deposited silicon
    • A.V. Zotov, and V.V. Korobtsov Present status of solid phase epitaxy of vacuum-deposited silicon J. Crystal Growth 98 1989 519
    • (1989) J. Crystal Growth , vol.98 , pp. 519
    • Zotov, A.V.1    Korobtsov, V.V.2
  • 20
    • 0041707735 scopus 로고    scopus 로고
    • A novel two-step annealing technique for the fabrication of high performance low temperature poly-Si TFTs
    • C.L. Fan, M.C. Chen, and Y. Chang A novel two-step annealing technique for the fabrication of high performance low temperature poly-Si TFTs J. Electrochem. Soc. 150 2003 H178
    • (2003) J. Electrochem. Soc. , vol.150
    • Fan, C.L.1    Chen, M.C.2    Chang, Y.3
  • 23
    • 1842475303 scopus 로고    scopus 로고
    • Fast and non-destructive assessment of epitaxial quality of polycrystalline silicon films on glass by optical measurements
    • A. Straub, P.I. Widenborg, A.B. Sproul, Y. Huang, N.-P. Harder, and A.G. Aberle Fast and non-destructive assessment of epitaxial quality of polycrystalline silicon films on glass by optical measurements J. Crystal Growth 265 2004 168
    • (2004) J. Crystal Growth , vol.265 , pp. 168
    • Straub, A.1    Widenborg, P.I.2    Sproul, A.B.3    Huang, Y.4    Harder, N.-P.5    Aberle, A.G.6
  • 24
    • 0000493391 scopus 로고    scopus 로고
    • Crystal grain nucleation in amorphous silicon
    • C. Spinella, S. Lombardo, and F. Priolo Crystal grain nucleation in amorphous silicon J. Appl. Phys. 84 1998 5383
    • (1998) J. Appl. Phys. , vol.84 , pp. 5383
    • Spinella, C.1    Lombardo, S.2    Priolo, F.3
  • 25
    • 0025385830 scopus 로고
    • Assessment of surface quality of SIMOX wafers by UV reflectance
    • G. Harbeke, and L. Jastrzebski Assessment of surface quality of SIMOX wafers by UV reflectance J. Electrochem. Soc. 137 1990 696
    • (1990) J. Electrochem. Soc. , vol.137 , pp. 696
    • Harbeke, G.1    Jastrzebski, L.2
  • 26
    • 0029306789 scopus 로고
    • Optical properties of intrinsic silicon at 300 K
    • M.A. Green, and M.J. Keevers Optical properties of intrinsic silicon at 300 K Progr. Photovolt. 3 1995 189
    • (1995) Progr. Photovolt. , vol.3 , pp. 189
    • Green, M.A.1    Keevers, M.J.2
  • 27
    • 0017994633 scopus 로고
    • Substrate-orientation dependence of the epitaxial regrowth rate from Si-implanted amorphous Si
    • L. Csepregi, E.F. Kennedy, J.W. Mayer, and T.W. Sigmon Substrate-orientation dependence of the epitaxial regrowth rate from Si-implanted amorphous Si J. Appl. Phys. 49 1978 3906
    • (1978) J. Appl. Phys. , vol.49 , pp. 3906
    • Csepregi, L.1    Kennedy, E.F.2    Mayer, J.W.3    Sigmon, T.W.4
  • 28
    • 0036777889 scopus 로고    scopus 로고
    • Dependence of the recombination in thin-film Si solar cells grown by ion-assisted deposition on the crystallographic orientation of the substrate
    • D.H. Neuhaus, N.-P. Harder, S. Oelting, R. Bardos, A.B. Sproul, P. Widenborg, and A.G. Aberle Dependence of the recombination in thin-film Si solar cells grown by ion-assisted deposition on the crystallographic orientation of the substrate Sol. Energy Mater. Sol. Cells 74 2002 225
    • (2002) Sol. Energy Mater. Sol. Cells , vol.74 , pp. 225
    • Neuhaus, D.H.1    Harder, N.-P.2    Oelting, S.3    Bardos, R.4    Sproul, A.B.5    Widenborg, P.6    Aberle, A.G.7
  • 29
    • 0025388108 scopus 로고
    • Numerical modeling of textured silicon solar cells using PC-1D
    • P.A. Basore Numerical modeling of textured silicon solar cells using PC-1D IEEE Trans. Electron Dev. TED- 37 1990 337
    • (1990) IEEE Trans. Electron Dev. , vol.TED-37 , pp. 337
    • Basore, P.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.