-
1
-
-
0000398235
-
A review of thin-film crystalline silicon for solar cell applications. Part 2: Foreign substrates
-
K.R. Catchpole, M.J. McCann, K.J. Weber, and A.W. Blakers A review of thin-film crystalline silicon for solar cell applications. Part 2 Foreign substrates Sol. Energy Mater. Sol. Cells 68 2001 173
-
(2001)
Sol. Energy Mater. Sol. Cells
, vol.68
, pp. 173
-
-
Catchpole, K.R.1
McCann, M.J.2
Weber, K.J.3
Blakers, A.W.4
-
2
-
-
79958195535
-
Flat panel imagers with pixel level amplifiers based on polycrystalline silicon thin-film transistor technology
-
J.P. Lu, K. Van Schuylenbergh, J. Ho, Y. Wang, J.B. Boyce, and R.A. Street Flat panel imagers with pixel level amplifiers based on polycrystalline silicon thin-film transistor technology Appl. Phys. Lett. 80 2002 4656
-
(2002)
Appl. Phys. Lett.
, vol.80
, pp. 4656
-
-
Lu, J.P.1
Van Schuylenbergh, K.2
Ho, J.3
Wang, Y.4
Boyce, J.B.5
Street, R.A.6
-
3
-
-
0030563303
-
High-quality polycrystalline silicon thin film prepared by a solid phase crystallization method
-
T. Matsuyama, N. Terada, T. Baba, T. Sawada, S. Tsuge, K. Wakisaka, and T. Tsuda High-quality polycrystalline silicon thin film prepared by a solid phase crystallization method J. Non-Cryst. Solids 198-200 1996 940
-
(1996)
J. Non-cryst. Solids
, vol.198-200
, pp. 940
-
-
Matsuyama, T.1
Terada, N.2
Baba, T.3
Sawada, T.4
Tsuge, S.5
Wakisaka, K.6
Tsuda, T.7
-
4
-
-
0032732931
-
Crystallization of a-Si:H on glass for active layers in thin film transistors - Effects of glass coating
-
Y.Z. Wang, S.J. Fonash, O.O. Awadelkarim, and T. Gu Crystallization of a-Si:H on glass for active layers in thin film transistors - effects of glass coating J. Electrochem. Soc. 146 1999 299
-
(1999)
J. Electrochem. Soc.
, vol.146
, pp. 299
-
-
Wang, Y.Z.1
Fonash, S.J.2
Awadelkarim, O.O.3
Gu, T.4
-
5
-
-
0036531549
-
CMOS polycrystalline silicon circuits on steel substrates
-
M. Wu, and S. Wagner CMOS polycrystalline silicon circuits on steel substrates J. Non-Cryst. Solids 299-302 2002 1316
-
(2002)
J. Non-Cryst. Solids
, vol.299-302
, pp. 1316
-
-
Wu, M.1
Wagner, S.2
-
6
-
-
0033337764
-
Polycrystalline silicon thin-films on glass by aluminium-induced crystallisation
-
O. Nast, S. Brehme, D.H. Neuhaus, and S.R. Wenham Polycrystalline silicon thin-films on glass by aluminium-induced crystallisation IEEE Trans. Electron. Dev. 46 1999 2062
-
(1999)
IEEE Trans. Electron. Dev.
, vol.46
, pp. 2062
-
-
Nast, O.1
Brehme, S.2
Neuhaus, D.H.3
Wenham, S.R.4
-
7
-
-
0001039356
-
Elucidation of the layer exchange mechanism in the formation of polycrystalline silicon by aluminium-induced crystallisation
-
O. Nast, and S.R. Wenham Elucidation of the layer exchange mechanism in the formation of polycrystalline silicon by aluminium-induced crystallisation J. App. Phy. 88 2000 124
-
(2000)
J. App. Phy.
, vol.88
, pp. 124
-
-
Nast, O.1
Wenham, S.R.2
-
8
-
-
0036645207
-
Surface morphology of poly-Si films made by aluminium-induced crystallisation on glass substrates
-
P.I. Widenborg, and A.G. Aberle Surface morphology of poly-Si films made by aluminium-induced crystallisation on glass substrates J. Crystal Growth 242 2002 270
-
(2002)
J. Crystal Growth
, vol.242
, pp. 270
-
-
Widenborg, P.I.1
Aberle, A.G.2
-
10
-
-
84949550182
-
Minority carrier properties of single- and polycrystalline silicon films formed by aluminium-induced crystallisation
-
Anchorage, IEEE, New York
-
D.H. Neuhaus, R. Bardos, L. Feitknecht, T. Puzzer, M.J. Keevers, A.G. Aberle, Minority carrier properties of single- and polycrystalline silicon films formed by aluminium-induced crystallisation, Proceedings of the 28th IEEE Photovoltaic Specialists Conference, Anchorage, IEEE, New York, 2000, pp. 65-68.
-
(2000)
Proceedings of the 28th IEEE Photovoltaic Specialists Conference
, pp. 65-68
-
-
Neuhaus, D.H.1
Bardos, R.2
Feitknecht, L.3
Puzzer, T.4
Keevers, M.J.5
Aberle, A.G.6
-
11
-
-
6344231595
-
Impurity and defect passivation in poly-Si films fabricated by aluminium-induced crystallisation
-
Osaka
-
P.I. Widenborg, A.B. Sproul, A.G. Aberle: Impurity and defect passivation in poly-Si films fabricated by aluminium-induced crystallisation, Proceedings of the third World Conference on Photovoltaic Energy Conversion (WCPEC-3), Osaka, 2003, pp. 1233-1236.
-
(2003)
Proceedings of the Third World Conference on Photovoltaic Energy Conversion (WCPEC-3)
, pp. 1233-1236
-
-
Widenborg, P.I.1
Sproul, A.B.2
Aberle, A.G.3
-
12
-
-
0035367486
-
Formation of large-grained uniform poly-Si films on glass at low temperature
-
A.G. Aberle, N.-P. Harder, and S. Oelting Formation of large-grained uniform poly-Si films on glass at low temperature J. Crystal Growth 226 2001 209
-
(2001)
J. Crystal Growth
, vol.226
, pp. 209
-
-
Aberle, A.G.1
Harder, N.-P.2
Oelting, S.3
-
13
-
-
6444241636
-
Polycrystalline silicon on glass thin-film solar cell research at UNSW using the seed layer concept
-
Osaka
-
A.G. Aberle, P.I. Widenborg, A. Straub, N.-P. Harder, Polycrystalline silicon on glass thin-film solar cell research at UNSW using the seed layer concept, Proceedings of the third World Conference on Photovoltaic Energy Conversion (WCPEC-3), Osaka, 2003, pp. 1194-1197.
-
(2003)
Proceedings of the Third World Conference on Photovoltaic Energy Conversion (WCPEC-3)
, pp. 1194-1197
-
-
Aberle, A.G.1
Widenborg, P.I.2
Straub, A.3
Harder, N.-P.4
-
14
-
-
17644437191
-
Aluminium-induced crystallization of amorphous silicon: Influence of material characteristics on the reaction
-
C. Ornaghi, G. Beaucarne, J. Poortmans, J. Nijs, and R. Mertens Aluminium-induced crystallization of amorphous silicon influence of material characteristics on the reaction Thin Solid Films 451-452 2004 476
-
(2004)
Thin Solid Films
, vol.451-452
, pp. 476
-
-
Ornaghi, C.1
Beaucarne, G.2
Poortmans, J.3
Nijs, J.4
Mertens, R.5
-
15
-
-
2442564874
-
Polycrystalline silicon thin film solar cells utilizing aluminium induced crystallization method
-
Y. Ishikawa, A. Nakamura, Y. Uraoka, and T. Fuyuki Polycrystalline silicon thin film solar cells utilizing aluminium induced crystallization method Jpn. J. Appl. Phys. 43 2004 877
-
(2004)
Jpn. J. Appl. Phys.
, vol.43
, pp. 877
-
-
Ishikawa, Y.1
Nakamura, A.2
Uraoka, Y.3
Fuyuki, T.4
-
16
-
-
13244260661
-
Epitaxial thickening of AIC polycrystalline silicon seed layers on glass by Hot Wire CVD
-
Utrecht, The Netherlands in press
-
J. Stradal, G. Scholma, H. Li, C.H.M. van der Werf, J.K. Rath, P.I. Widenborg, P. Campbell, A.G. Aberle, R.E.I. Schropp, Epitaxial thickening of AIC polycrystalline silicon seed layers on glass by Hot Wire CVD, Proceedings of the third International Conference on HWCVD (Cat-CVD) Processes, Utrecht, The Netherlands, 2004, in press.
-
(2004)
Proceedings of the Third International Conference on HWCVD (Cat-CVD) Processes
-
-
Stradal, J.1
Scholma, G.2
Li, H.3
Werf Der Van, C.H.M.4
Rath, J.K.5
Widenborg, P.I.6
Campbell, P.7
Aberle, A.G.8
Schropp, R.E.I.9
-
17
-
-
0036778473
-
Thin film poly-Si solar cells using PECVD and Cat-CVD with light confinement structure by RIE
-
K. Niira, H. Senta, H. Hakuma, M. Komoda, H. Okui, K. Fukui, H. Arimune, and K. Shirasawa Thin film poly-Si solar cells using PECVD and Cat-CVD with light confinement structure by RIE Sol. Energy Mater. Sol. Cells 74 2002 247
-
(2002)
Sol. Energy Mater. Sol. Cells
, vol.74
, pp. 247
-
-
Niira, K.1
Senta, H.2
Hakuma, H.3
Komoda, M.4
Okui, H.5
Fukui, K.6
Arimune, H.7
Shirasawa, K.8
-
18
-
-
0037932026
-
Fabrication of thin-film polycrystalline silicon solar cells by silane-gas-free process using aluminium-induced crystallization
-
T. Ito, H. Fukushima, and M. Yamaguchi Fabrication of thin-film polycrystalline silicon solar cells by silane-gas-free process using aluminium-induced crystallization Jpn. J. Appl. Phys. 42 2003 1526
-
(2003)
Jpn. J. Appl. Phys.
, vol.42
, pp. 1526
-
-
Ito, T.1
Fukushima, H.2
Yamaguchi, M.3
-
19
-
-
0024769312
-
Present status of solid phase epitaxy of vacuum-deposited silicon
-
A.V. Zotov, and V.V. Korobtsov Present status of solid phase epitaxy of vacuum-deposited silicon J. Crystal Growth 98 1989 519
-
(1989)
J. Crystal Growth
, vol.98
, pp. 519
-
-
Zotov, A.V.1
Korobtsov, V.V.2
-
20
-
-
0041707735
-
A novel two-step annealing technique for the fabrication of high performance low temperature poly-Si TFTs
-
C.L. Fan, M.C. Chen, and Y. Chang A novel two-step annealing technique for the fabrication of high performance low temperature poly-Si TFTs J. Electrochem. Soc. 150 2003 H178
-
(2003)
J. Electrochem. Soc.
, vol.150
-
-
Fan, C.L.1
Chen, M.C.2
Chang, Y.3
-
21
-
-
0005451574
-
The effect of hydrogen-plasma and PECVD-nitride deposition on bulk and surface passivation in string-ribbon silicon solar cells
-
D.S. Ruby, W.L. Wilbanks, C.B. Fleddermann, J.I. Hanoka, The effect of hydrogen-plasma and PECVD-nitride deposition on bulk and surface passivation in string-ribbon silicon solar cells, Proceedings of the 13th European Community Photovoltaic Solar Energy Conference, 1995, pp. 1412-1414.
-
(1995)
Proceedings of the 13th European Community Photovoltaic Solar Energy Conference
, pp. 1412-1414
-
-
Ruby, D.S.1
Wilbanks, W.L.2
Fleddermann, C.B.3
Hanoka, J.I.4
-
23
-
-
1842475303
-
Fast and non-destructive assessment of epitaxial quality of polycrystalline silicon films on glass by optical measurements
-
A. Straub, P.I. Widenborg, A.B. Sproul, Y. Huang, N.-P. Harder, and A.G. Aberle Fast and non-destructive assessment of epitaxial quality of polycrystalline silicon films on glass by optical measurements J. Crystal Growth 265 2004 168
-
(2004)
J. Crystal Growth
, vol.265
, pp. 168
-
-
Straub, A.1
Widenborg, P.I.2
Sproul, A.B.3
Huang, Y.4
Harder, N.-P.5
Aberle, A.G.6
-
25
-
-
0025385830
-
Assessment of surface quality of SIMOX wafers by UV reflectance
-
G. Harbeke, and L. Jastrzebski Assessment of surface quality of SIMOX wafers by UV reflectance J. Electrochem. Soc. 137 1990 696
-
(1990)
J. Electrochem. Soc.
, vol.137
, pp. 696
-
-
Harbeke, G.1
Jastrzebski, L.2
-
26
-
-
0029306789
-
Optical properties of intrinsic silicon at 300 K
-
M.A. Green, and M.J. Keevers Optical properties of intrinsic silicon at 300 K Progr. Photovolt. 3 1995 189
-
(1995)
Progr. Photovolt.
, vol.3
, pp. 189
-
-
Green, M.A.1
Keevers, M.J.2
-
27
-
-
0017994633
-
Substrate-orientation dependence of the epitaxial regrowth rate from Si-implanted amorphous Si
-
L. Csepregi, E.F. Kennedy, J.W. Mayer, and T.W. Sigmon Substrate-orientation dependence of the epitaxial regrowth rate from Si-implanted amorphous Si J. Appl. Phys. 49 1978 3906
-
(1978)
J. Appl. Phys.
, vol.49
, pp. 3906
-
-
Csepregi, L.1
Kennedy, E.F.2
Mayer, J.W.3
Sigmon, T.W.4
-
28
-
-
0036777889
-
Dependence of the recombination in thin-film Si solar cells grown by ion-assisted deposition on the crystallographic orientation of the substrate
-
D.H. Neuhaus, N.-P. Harder, S. Oelting, R. Bardos, A.B. Sproul, P. Widenborg, and A.G. Aberle Dependence of the recombination in thin-film Si solar cells grown by ion-assisted deposition on the crystallographic orientation of the substrate Sol. Energy Mater. Sol. Cells 74 2002 225
-
(2002)
Sol. Energy Mater. Sol. Cells
, vol.74
, pp. 225
-
-
Neuhaus, D.H.1
Harder, N.-P.2
Oelting, S.3
Bardos, R.4
Sproul, A.B.5
Widenborg, P.6
Aberle, A.G.7
-
29
-
-
0025388108
-
Numerical modeling of textured silicon solar cells using PC-1D
-
P.A. Basore Numerical modeling of textured silicon solar cells using PC-1D IEEE Trans. Electron Dev. TED- 37 1990 337
-
(1990)
IEEE Trans. Electron Dev.
, vol.TED-37
, pp. 337
-
-
Basore, P.A.1
|