A novel two-step annealing technique for the fabrication of high performance low temperature poly-Si TFTs

Journal of the Electrochemical Society

Volumn 150, Issue 8, 2003, Pages

  Fan, Ching Lin ^a   Chen, Mao Chieh ^a   Chang, Yih ^b  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; CRYSTAL DEFECTS; CRYSTALLIZATION; EXCIMER LASERS; NUCLEATION; PHASE TRANSITIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYSILICON; SEMICONDUCTOR DEVICE MANUFACTURE;

EXCIMER LASER ANNEALING SCHEMES; GRAIN DEFECTS; TWO STEP ANNEALING;

THIN FILM TRANSISTORS;

EID: 0041707735     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1590997     Document Type: Article

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