Basic aspects of deep lithography with particles for the fabrication of micro-optical and micro-mechanical structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5454, Issue , 2004, Pages 52-63

  Volckaerts, Bart ^a   Vynck, Pedro ^a   Vervaeke, Michael ^a   Cosentino, Luigi ^b   Finocchiaro, Paolo ^b   Reichart, Patrick ^c   Datzmann, Gerd ^c   Hauptner, Andreas ^c   Dollinger, Günther ^c   Hermanne, Alex ^a   Thienpont, Hugo ^a  

^a VRIJE UNIVERSITEIT BRUSSEL   (Belgium)

^b INFN SEZIONE DI CATANIA   (Italy)

^c TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

Deep lithography; Dose simulations and optical surface profiles; Ion stopping; Micro machining; Micro mechanics; Micro optics; Plastics

Indexed keywords

ASPECT RATIO; COMPOSITE MICROMECHANICS; COMPUTER SOFTWARE; FABRICATION; MICROMACHINING; MICROOPTICS; MICROSTRUCTURE; OPTICAL SYSTEMS;

DEEP LITHOGRAPHY; DOSE SIMULATIONS; ION STOPPING; OPTICAL SURFACE PROFILES;

PHOTOLITHOGRAPHY;

EID: 19944431256     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.547718     Document Type: Conference Paper

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