Deep light ion lithography in PMMA - A parameter study

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 132, Issue 3, 1997, Pages 430-438

  Schrempel, F ^a   Witthuhn, W ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

Ion irradiation; LIGA; Lithography; Particle radiation; PMMA; Polymethylmethacrylate

Indexed keywords

DOSIMETRY; ETCHING; HELIUM; MICROSTRUCTURE; PHOTOLITHOGRAPHY; POLYMETHYL METHACRYLATES; PROTONS; RADIATION EFFECTS; THERMAL EFFECTS;

DEEP LIGHT ION LITHOGRAPHY;

ION BEAM LITHOGRAPHY;

EID: 0031272299     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(97)00449-7     Document Type: Article

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