Excimer pulsed laser deposition and annealing of YSZ nanometric films on Si substrates

Applied Surface Science

Volumn 248, Issue 1-4, 2005, Pages 270-275

  Caricato, A P ^a   Barucca, G ^b   Di Cristoforo, A ^b   Leggieri, G ^a   Luches, A ^a   Majni, G ^b   Martino, M ^a   Mengucci, P ^b  

^a UNIVERSITY OF SALENTO   (Italy)

^b UNIVERSITÀ POLITECNICA DELLE MARCHE   (Italy)

Author keywords

Annealing treatments; Electron microscopy; Grazing incidence X ray diffraction; Pulsed laser deposition; X ray reflectivity; Yttria stabilised zirconia

Indexed keywords

ANNEALING; ELECTRIC PROPERTIES; ELECTRON MICROSCOPY; ENERGY DISSIPATION; EXCIMER LASERS; HEAT TREATMENT; HYSTERESIS; LEAKAGE CURRENTS; POLYCRYSTALLINE MATERIALS; PULSED LASER DEPOSITION; SILICON; X RAY DIFFRACTION ANALYSIS; YTTRIUM COMPOUNDS;

ANNEALING TREATMENTS; GRAZING INCIDENCE X-RAY DIFFRACTION; X-RAY REFLECTIVITY; YTTRIA-STABILIZED ZIRCONIA;

THIN FILMS;

EID: 19944375809     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2005.03.048     Document Type: Conference Paper

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