Optical lithography simulation and photoresist optimization for photomask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1215-1226

  Rathsack, Benjamen M ^a   Tabery, Cyrus E ^a   Scheer, Steven A ^a   Pochkowski, Mike ^a   Philbin, Cece ^a   Kalk, Franklin ^a   Henderson, Clifford L ^a   Buck, Peter D ^a   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMIUM COMPOUNDS; COMPUTER SIMULATION; MASKS; OPTIMIZATION; PHASE SHIFT; QUARTZ; SEMICONDUCTOR DEVICE MODELS;

OPTICAL PROXIMITY CORRECTION; PHOTOMASKS;

PHOTORESISTS;

EID: 0032663145     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350173     Document Type: Conference Paper

References (18)