Novel resist development system for photomasks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 746-753

  Itoh, Masamitsu ^a   Sakurai, Hideaki ^a   Esaki, Yukihiko ^b   Ooishi, Kotaro ^b   Sakamoto, Kazuo ^b  

^a TOSHIBA CORPORATION   (Japan)

^b Toshiba Corp ^*

Author keywords

Developer; Development; Loading effect; PGSD; Proximity gap; Resist; Rinse; Scan; Suction

Indexed keywords

ERROR CORRECTION; INTEGRATED CIRCUIT MANUFACTURE; NOZZLES; PHOTORESISTS; SOLUBILITY; SURFACE CLEANING;

PHOTOMASKS;

MASKS;

EID: 0038303153     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467260     Document Type: Conference Paper

References (1)

1. nd annual BACUS symposium on photomask technology.