Dissolution performance of device pattern with low-impact development

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4345, Issue II, 2001, Pages 665-672

  Ito, S ^a   Hayasaki, K ^a   Nakamura, H ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

CCD camera; Critical dimension; Development; Diffracted light; Low impact; Monitor; Uniformity

Indexed keywords

CHARGE COUPLED DEVICES; DISPENSERS; DISSOLUTION; ELECTROMAGNETIC WAVE DIFFRACTION; NOZZLES;

CRITICAL DIMENSIONS (CD);

LITHOGRAPHY;

EID: 0034762609     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436900     Document Type: Conference Paper

References (4)

1. The effect of mixing development method on CD uniformity
2. High-accuracy development monitoring technology
3. Use of diffracted light from latent images to improve lithography control
4. Use of scatterometric latent image detector in closed loop feedback control of linewidth