Performance of Proximity Gap Suction Development (PGSD)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 737-745

  Sakurai, Hideaki ^a   Itoh, Masamitsu ^a   Esaki, Yukihiko ^c   Ooishi, Kotaro ^c   Sakamoto, Kazuo ^c   Nakao, Mika ^b   Nishimura, Toshiharu ^b   Miyashita, Hiroyuki ^b   Hayashi, Naoya ^b  

^a TOSHIBA CORPORATION   (Japan)

^b DAI NIPPON PRINTING CO LTD   (Japan)

^c Dai Nippon Printing Co Ltd ^*

Author keywords

Developer; Development; Dirty developer; Gap; Loading effect; PGSD; Proximity; Resist load; Suction

Indexed keywords

CRYSTAL DEFECTS; ERROR CORRECTION; INTEGRATED CIRCUIT MANUFACTURE; NOZZLES; PATTERN MATCHING; PHOTORESISTS;

DIRTY DEVELOPERS;

MASKS;

EID: 0037627682     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467297     Document Type: Conference Paper

References (3)

1. H.Nakamura et al., "Influence of Alkaline Concentration Variation on CD in KrF Resist Development", Journal of Photopolymer Science and Technology, Vol.14, Num.3, (2001), 435-438
2. nd annual BACUS symposium on photomask technology.
3. S.Kyoh et al., "A new photomask pattern generation method based on I-line stepper", Proceeding of SPIE, Vol.4066, (2000), 631-640