Using the critical ionization model for resist development to estimate contrast curves and roughening

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 334-342

  Houle, Frances A ^a   Hinsberg, William D ^a   Sanchez, Martha I ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

Chemical kinetics; Polymer dissolution; Resist development; Roughness; Simulations

Indexed keywords

COMPOSITION; COMPUTER SIMULATION; DISSOLUTION; GELATION; IMAGE ANALYSIS; IONIZATION; MATHEMATICAL MODELS; PHASE TRANSITIONS; POLYSTYRENES; REACTION KINETICS; THICKNESS MEASUREMENT;

CHEMICALLY AMPLIFIED PHOTORESIST; CONTRAST CURVES; IONIZATION MODEL; POLYMER CHAIN; RESIST DEVELOPMENT; ROUGHENING; TERTBUTYLOXYCARBONYLOXYSTYRENE;

PHOTORESISTS;

EID: 0141499970     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485131     Document Type: Conference Paper

References (29)

1. G. Arthur, C. A. Mack, N. Eilbeck, B. Martin Microelectron. Eng. 41/42, 311 (1998).
2. R. R. Dammel, J. P. Sagan, E. Kokinda, N. Eilbeck, C. A.Mack, G. G. Arthur, C. L. Henderson, S. A. Scheer, B. M. Rathsack, C. G. Willson SPIE Adv. Resist Proc. Technol. XV 3333, 401 (1998).
3. T. A. Brunner, R. A. Ferguson, SPIE Optical Microlithography IX 2726, 198 (1996).
4. G. M. Gallatin, SPIE Lithography for Semiconductor Manufacturing II 4404, 123 (2001).
5. M. I. Sanchez, W. D. Hinsberg, F. A. Houle, J. A. Hoffnagle, unpublished; J. L. Cobb, P. Dentinger, L. Hunter, D. O'Connell, G. Gallatin, B. Hinsberg, F. Houle, M. Sanchez, W.-D. Domke, S. Wurnm, U. Okoroyaanwu, S. H. Lee, SPIE Emerging Lithographic Technologies VI 4688, 412 (2002).
6. H. Levinson, Solid State Technol., January 2002, 36.
7. T. Yamaguchi, H. Namatsu, M. Nagase, K. Yamazaki, K. Kurihara Appl. Phys. Lett. 71, 2388 (1997).
8. Q. Lin, D. Goldfarb, M. Angelopoulos, S. Sriram, J. S. Moore SPIE Adv. Resist Proc. Technol. XVIII 4345, 277 (2001).
9. G. M. Schmid, M. D. Smith, C. A. Mack, V. K. Singh, S. D. Burns, C. G. Willson SPIE Adv. Resist Proc. Technol. XVIII 4345, 1037 (2001).
10. W. Hinsberg, F. A. Houle, J. Hoffnagle, M. Sanchez, G. Wallraff, M. Morrison, S. Frank J. Vac. Sci. Technol B 16, 3689 (1998).
11. J. Shin, G. Han, Y. Ma, K. Moloni, F. Cerrina, J. Vac. Sci. Technol B 19, 2890 (2001).
12. G. Wallraff, J. Hutchinson, W. Hinsberg, F. A. Houle, P. Seidel, R. Johnson, W. Oldham, J. Vac. Sci. Technol. B 12, 3857 (1994).
13. P. C. Tsiartis, L. W. Flanigin, C. L. Henderson, W. D. Hinsberg, I. C. Sanchez, R. T. Bonnecaze and C. G. Willson Macromolecules 30, 4656 (1997).
14. L. W. Flanagin, C. L. McAdams, W. D. Hinsberg, I. C. Sanchez, C. G. Willson Macromolecules 32, 5337 (1999).
15. S. D. Burns, G. M. Schmid, P. C. Tsiartis, C. G. Willson, L. Flanagin J. Vac. Sci. Technol. B 20, 537 (2002).
16. L. W. Flanagin, V. K. Singh, C. G. Willson J. Vac. Sci. Technol. B 17, 1371 (1999).
17. H-Y Shih, H. Zhuang, A. Reiser, I. Teraoka, J. Goodman, P. M. Gallagher-Wetmore Macromolecules 31, 1208 (1998).
18. G. P. Patsis, N. Glezos, I. Raptis, E. S. Valamontes J. Vac. Sci. Technol. B 17, 3367 (1999).
19. F. A. Houle, W. D. Hinsberg, M. I. Sanchez Macromolecules 35, 3591 (2002).
20. B. Narashimhan, N. A. Peppas Adv. Polymer Sci. Polymer Anal. Polymer Phys. 128, 157 (1997)
21. M. F. Herman, S. F. Edwards Macromolecules 23, 3662 (1990).
22. F. A. Houle, W. D. Hinsberg, M. I. Sanchez, J. A. Hoffnagle J. Vac. Sci. Technol. B 20, 924 (2002).
23. F. A. Houle, W. D. Hinsberg, M. Morrison, G. Wallraff, C. Larson, M. Sanchez, J. Hoffnagle, J. Vac. Sci. Technol. B 18, 1874 (2000).
24. T. Kumada, H. Adachi, H. Watanabe, H. Sumitani SPIE Adv. Resist Technol. Proc. XIV 3049, 459 (1997).
25. D. He, F. Cerrina, J. Vac. Sci. Technol. B 16, 3748 (1998).
26. J. L. Cobb, F. A. Houle, G. M. Gallatin SPIE Adv. Resist Technol. Proc. XX, 5039 (2003).
27. W. D. Hinsberg, S. W. Lee, K. K. Kanazawa, unpublished work (2002)
28. W. D. Hinsberg, S. W. Lee, K. K. Kanazawa Anal. Chem., 74, 125 (2002)
29. W. D. Hinsberg, S. W. Lee, D. Horne, K. K. Kanazawa SPIE Adv. Resist Technol. Proc. XVII 4345, 1 (2001).