The initial stage of the reaction between amorphous silicon and crystalline aluminum

Journal of Applied Physics

Volumn 97, Issue 9, 2005, Pages

  He, D ^a   Wang, J Y ^a   Mittemeijer, E J ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EXCHANGE PROCESS; INDUCED CRYSTALLIZATION; SUBLAYERS; THERMAL OXIDATION;

CRYSTALLINE MATERIALS; CRYSTALLIZATION; GRAIN BOUNDARIES; NUCLEATION; REACTION KINETICS; SILICON; SPUTTER DEPOSITION; SUBSTRATES;

ALUMINUM;

EID: 18844397834     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1890449     Document Type: Article

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