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Applied Physics A: Materials Science and Processing

Volumn 79, Issue 3, 2004, Pages 681-690

Microstructural changes in amorphous Si/crystalline Al thin bilayer films upon annealing

(3) Zhao, Y H a,b Wang, J Y a Mittemeijer, E J a

a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS (Germany)

b LOS ALAMOS NATIONAL LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; AMORPHOUS MATERIALS; ANNEALING; AUGER ELECTRON SPECTROSCOPY; CRYSTALLINE MATERIALS; MICROELECTRONICS; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS; SPUTTER DEPOSITION; THERMODYNAMICS; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

ELASTIC ENERGY; MICROSTRAIN; SUBLAYERS; THIN BILAYER FILMS;

CRYSTAL MICROSTRUCTURE;

EID: 3042543646 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-003-2247-9 Document Type: Article

Times cited : (39)

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- Y.H. Zhao, J.Y. Wang, E.J. Mittemeijer: to be published
- Y.H. Zhao, J.Y. Wang, E.J. Mittemeijer: to be published

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.