Interaction of amorphous Si and crystalline Al thin films during low-temperature annealing in vacuum

Thin Solid Films

Volumn 433, Issue 1-2 SPEC., 2003, Pages 82-87

  Zhao, Y H ^a   Wang, J Y ^a   Mittemeijer, E J ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Crystallite size; Crystallization and layer exchange; Microstrain; Texture and macrostress

Indexed keywords

ALUMINUM; AMORPHOUS FILMS; ANNEALING; CRYSTALLINE MATERIALS; LOW TEMPERATURE EFFECTS; SILICON;

LOW TEMPERATURE ANNEALING;

THIN FILMS;

EID: 0038616156     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00282-7     Document Type: Conference Paper

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