A new method for the determination of the diffusion-induced concentration profile and the interdiffusion coefficient for thin film systems by Auger electron spectroscopical sputter depth profiling

Journal of Materials Research

Volumn 19, Issue 11, 2004, Pages 3389-3397

  Wang, J Y ^a   Mittemeijer, E J ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; DIFFUSION; GRAIN BOUNDARIES; ITERATIVE METHODS; LEAST SQUARES APPROXIMATIONS; MATHEMATICAL MODELS; SPUTTERING; SURFACE ROUGHNESS;

AUGER ELECTRON SPECTROSCOPICAL SPUTTER DEPTH PROFILING; DIFFUSION INDUCED CONCENTRATION PROFILE; INTERDIFFUSION COEFFICIENT; ITERATIVE LEAST SQUARES PROCEDURE;

THIN FILMS;

EID: 11244352234     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2004.0430     Document Type: Article

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