Hydrogen-containing carbon nitride films produced by the combined hot filament-plasma CVD technique

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 280-284

  Wang, Jianjun ^a   De Moraes, Mário A B ^a   Baranauskas, Vítor ^b   Durrant, Steven F ^b  

^a Depto Fis Apl Inst Fis Gleb W   (Brazil)

^b Faculdade E   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION EFFECTS; ELECTRODES; HYDROCARBONS; HYDROGEN; INFRARED SPECTROSCOPY; MOLECULAR DYNAMICS; MOLECULAR STRUCTURE; NITRIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; RUTHERFORD BACKSCATTERING SPECTROSCOPY; VACUUM APPLICATIONS;

COMBINED HOT FILAMENT-PLASMA CHEMICAL VAPOR DEPOSITION; HYDROGEN-CONTAINING CARBON NITRIDE FILMS;

PROTECTIVE COATINGS;

EID: 18744432663     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01331-6     Document Type: Article

References (26)

1. Liu A.Y., Cohen M.L. Science. 245:1989;841.
2. Liu A.Y., Cohen M.L. Phys. Rev. B. 41:1990;10727.
3. Chowdhury A.K.M.S., Cameron D.C., Monclus M.A. Thin Solid Films. 355/356:1999;85.
4. Kusano Y., Evetts J.E., Somekh R.E., Hutchings I.M. Thin Solid Films. 332:1998;56.
5. Yu K.M., Cohen M.L., Haller E.E., Hanser W.L., Liu A.Y., Wu I.C. Phys. Rev. B. 49:1994;5034.
6. Weber F.-R., Oeschner H. Thin Solid Films. 355/356:1999;73.
7. Enders B., Horino H., Tsoubuchi N., Chayahara A., Kinomura A., Fujii K. Nucl. Instrum. Methods Phys. Res. B. 121:1997;73.
8. Kitasawa N., Kasai H., Watanabe Y., Nakamura Y. Surf. Coat. Technol. 120/121:1999;418.
9. Bouseta A., Lu M., Bensaoula A. Appl. Phys. Lett. 65:1994;696.
10. Kim J.H., Ahn D.H., Kim Y.W., Baik H.K. J. Appl. Phys. 82:1997;658.
11. Zhang M., Wang P., Nakayama Y. Jpn. J. Appl. Phys. 36:1997;4893.
12. Zhang Z.F., Zhou Z.H., Li H. Appl. Phys Lett. 68:1996;634.
13. Chen Y., Guo P., Wang E.G. Mod. Phys. Lett. B. 10:1996;615.
14. Chowdhury A.K.M.S., Cameron D.C., Gregg M.J., Hashni M.S.J. J. Mater. Res. 14:1999;2359.
15. Liu A.Y., Wentzcovitch R.M. Phys. Rev. B. 50:1994;10362.
16. Chen Y., Guo L., Wang E.G. J. Crystal Growth. 179:1997;515.
17. Kim J.H., Baik H.K. Solid State Commun. 104:1997;653.
18. Yeh T.A., Lin C.L., Sivertsen J.M., Judy J.H. IEEE Trans. Magn. 27:1991;5163.
19. Doolitle R.L. Nucl. Instrum. Methods B. 15:1986;227.
20. Yasuda H., Bumgarner M.O., Hillman J.J. J. Appl. Polym. Sci. 19:1975;531.
21. Yasuda H. Plasma Polymerization. 1985;124 Academic Press, New York.
22. Donnet C., Martin J.M., Fontaine J., Sánchez-López J.C., Quirós C., Elizalde E., Sanz J.M., Rojas T.C., Fernández A. Surf. Coat. Technol. 120/121:1999;594.
23. Durrant S.F., Marçal N., Castro S.G., Vinhas R.C.G., de Moraes M.A.B., Nicola J.H. Thin Solid Films. 259:1995;139.
24. Durrant S.F., de Moraes M.A. B. J. Polym. Sci. B: Polym. Phys. 36:1998;1881.
25. Kobayashi S., Nozaki S., Morisaki H., Masaki S. Jpn. J. Appl. Phys. 36:1997;5187.
26. R.C. Weast (Ed.), Handbook of Chemistry and Physics, 55th ed., CRC Press, Cleveland, 1974, p. F205.