Low-energy plasma beam deposition of carbon nitride layers with β-C3N4-like fractions

Thin Solid Films

Volumn 355, Issue , 1999, Pages 73-78

  Weber, F R ^a   Oechsner, H ^a  

^a Rheinland Pfälzische Technische Universität Kaiserslautern Landau   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CRYSTAL ORIENTATION; DEPOSITION; ELECTRON DIFFRACTION; ENERGY GAP; ION BEAMS; MASS SPECTROMETRY; NITRIDES; NITROGEN; SILICON; STOICHIOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; LOW-ENERGY PLASMA BEAM DEPOSITION; TRANSMISSION ELECTRON DIFFRACTION (TED);

AMORPHOUS FILMS;

EID: 0033350584     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00502-7     Document Type: Article

References (24)

1. Liu A.Y., Cohen M.L. Phys. Rev. B. 41:1990;10727.
2. Liu A.Y., Wentzkovich M. Phys. Rev. B. 50:1994;10362.
3. Boyd K.J., Marton D., Todorov S.S., Al-Bayati A.H., Kulik J., Zuhr R.A., Rabalais J.W. J. Vac. Sci. Technol. A. 13:1995;2110.
4. M.A. Baker, P. Hammer, C. Lenardi, W. Gissler, Surf. Coat. Technol. (1999) submitted.
5. Zheng W.T., Sjöström H., Ivanov I., Xing K.Z., Broitman E., Salaneck W.R., Greene J.E., Sundgren J.-E. J. Vac. Sci. Technol. A. 14:1996;2696.
6. Riviere J.R., Texier D., Delafond J., Jaouen M., Mathe E.L., Chaumont J. Mater. Lett. 22:1995;115.
7. Fujimoto F., Ogata K. Jpn. J. Appl. Phys. Part 2. 32:1993;420.
8. Niu C., Iu Y.Z., Lieber C.M. Science. 261:1993;334.
9. Yu K.M., Cohen M.L., Haller E.E., Hansen W.L., Liu A.Y., Wu I.C. Phys. Rev. B. 49:1994;5034.
10. Weber F.-R., Oechsner H. Surf. Coat. Technol. 74-75:1995;704.
11. Gnaser H., Oechsner H. Surf. Interface Anal. 21:1994;257.
12. Weber F.-R., Oechsner H. Surf. Coat. Technol. 59:1993;234.
13. Waldorf J., Oechsner H., Füßer H.J. Thin Solid Films. 174:1989;39.
14. H. Oechsner, H.J.Füßer, J.Waldorf, A. Fuchs, Proc. 1st Int. Conf. Plasma Surf. Eng., Garmisch-Partenkirchen, 1988, vol. II, DGM Informationsgesellschaft, Oberursel, 1989, p. 1017.
15. M. Haag, Diploma thesis, Kaiserslautern, 1994.
16. Bock W., Gnaser H., Oechsner H. Anal. Chim. Acta. 297:1994;277.
17. Tauc J. Progr. Semicond. 9:1965;87.
18. Barber M., Connor J.A., Guest M.F., Hillier T.H., Schwarz M., Stacey M. J. Chem. Soc. Faraday Trans. II. 69:1973;551.
19. Boehland H., Hanag W., Meisel A., Scheibe R. Z. Chem. 10:1981;372.
20. Gelius U., Heden P.F., Hedman J., Lindberg B.J., Maune R., Nordberg R., Nadling R., Siegbahn K. Phys. Scr. 2:1970;70.
21. Lindberg B.J., Hedman J. Chem. Scr. 7:1975;155.
22. Savvides N. J. Appl. Phys. 59:1986;4233.
23. Computer Program 3.3 for Indigo 2, Center for Electron Microscopy, Lausanne.
24. Oechsner H. J. Vac. Sci. Technol. A. 16:1998;1956.