Mass spectrometric investigation of the positive ions formed in low-pressure oxygen/tetraethoxysilane and argon/tetraethoxysilane plasmas

Journal of Applied Physics

Volumn 89, Issue 9, 2001, Pages 5227-5229

  Aumaille, K ^a   Granier, A ^a   Grolleau, B ^a   Turban, G ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035339654     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1355694     Document Type: Article

References (13)

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