100 nm OPC mask patterning using raster-scan, 50 kV pattern generation technology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4562 I, Issue , 2001, Pages 1-8

  Abboud, Frank ^a   Baik, Ki Ho ^a   Chakarian, Varoujan ^a   Cole, Damon ^a   Daniel, Jay ^a   Dean, Robert ^a   Gesley, Mark ^a   Lu, Maiying ^a   Naber, Robert ^a   Newman, Tom ^a   Raymond III, Frederick ^a   Trost, David ^a   Wiltse, Mark ^a   DeVore, William ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

CAR; Electron beam; Graybeam; Lithography; MEBES; OPC; Photomask

Indexed keywords

DYNAMIC RANDOM ACCESS STORAGE; ELECTRON BEAMS; MASKS; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICES;

OPTICAL PROXIMITY CORRECTION (OPC);

MICROELECTROMECHANICAL DEVICES;

EID: 18644382182     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.491928     Document Type: Article

References (10)

1. th Annual BACUS Symposium on Photomask Technology, SPIE vol. 3873, pp. 995-1016, 1999.
2. A. Tritchkov, J. Stiriman, and M. Rieger, "Alternating PSM optimization using model based OPC," Optical Microlithography XII, SPIE vol. 3679, pp. 556-566.
3. O. Toublan, E. Sahouria, N. Cobb, T. Do, T. Donnelly, Y. Granik, F. Schellenberg, and P. Schiavone, "Phase aware proximity correction for advanced masks," Optical Microlithography XIII, SPIE vol. 4000, pp. 160-170, 2000.
4. Q. He, M. C. Chang, S. Palmer, and K. Sadra, "OPC methodology and implementation to prototyping of small SRAM cells of 0.18 μm node logic gate levels," Optical Microlithography XIII, SPIE vol. 4000, pp. 90-98, 2000.
5. th Annual BACUS Symposium on Photomask Technology, SPIE vol. 4186, pp. 452-459, 2001.
6. L. Liebmann, J. Brace, W. Chu, M. Cross, I. Graur, J. Krueger, W. Leipold, S. Mansfield, A. McGuire, and D. Sundling, "Optimizing style options for sub-resolution assist features," Optical Microlithography XVI, SPIE vol. 4346, pp. 141-152, 2001.
7. th Annual BACUS Symposium on Photomask Technology, SPIE vol. 4186, pp. 1-15, 2001.
8. C. Saner, F. Abboud, S. Babin, V. Chakarian, A Ghanbari, R. Innes, D. Trost, and F. Raymond III, "Initial benchmarking of a new electron-beam raster pattern generator for 130-100nm maskmaking," Emerging Lithographic Technologies IV, SPIE vol. 3997, pp. 284-300, 2000.
9. F. Abboud, S. Babin, V. Chakarian, A. Ghanbari, R. Innes, F. Raymond III, A. Sagle, and C. Sauer, "Design considerations for an electron-beam pattern generator for the 130-nm generation masks," Photomask and x-ray mask technology VI, SPIE vol. 3748, pp. 385-399, 1999.
10. K.H. Balk, V. Chakarian, B. Dean, M. Lu, B. Naber, T. Newman, M. Wiltse, and F. Abboud, "High productivity mask writer with broad operating range," Photomask and Next-Generation Lithography Mask Technology VIII, SPIE vol. 4409, pp. 228-237.