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Applied Physics A: Materials Science and Processing

Volumn 80, Issue 7, 2005, Pages 1469-1479

Investigations on the behaviour of C60 as a resist in X-ray lithography

(6) Klesper, H a Baumann, R a Bargon, J a Hormes, J a Zumaque Diaz H a Kohring, G A b

a UNIVERSITY OF BONN (Germany)

b NEC LABORATORIES EUROPE (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITION REACTIONS; INTERFACES (MATERIALS); MASKS; MICROSTRUCTURE; POLYMERIZATION; SYNCHROTRON RADIATION; X RAY ANALYSIS; X RAY LITHOGRAPHY;

CARBON MICROSTRUCTURES; CYCLOADDITION; RESIST; X-RAY MASKS;

FULLERENES;

EID: 18544385496 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-004-3139-3 Document Type: Article

Times cited : (7)

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