Morphological control of nanoporous films by the use of functionalized cyclodextrins as porogens

Advanced Functional Materials

Volumn 14, Issue 3, 2004, Pages 277-282

  Yim, Jin Heong ^a   Seon, Jong Baek ^a   Jeong, Hyun Dam ^a   Pu, Lyong Sun ^a   Baklanov, Mikhail R ^b   Gidley, David W ^c  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

^b IMEC   (Belgium)

^c UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DERIVATIVES; ELASTIC MODULI; ELECTRIC PROPERTIES; HARDNESS; MECHANICAL PROPERTIES; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PERMITTIVITY; POROSITY; SILICON COMPOUNDS;

CYCLODEXTRINS; FILM PROPERTIES; MORPHOLOGICAL CONTROL; NANOPOROUS FILMS; POROGEN INDUCED PORE DIAMETERS; POROGENS; POROUS SILSESQUIOXANE;

THIN FILMS;

EID: 1842587047     PISSN: 1616301X     EISSN: None     Source Type: Journal    
DOI: 10.1002/adfm.200305019     Document Type: Article

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