High accuracy aerial image measurement for electron beam projection lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 483-490

  Yahiro, T ^a   Hirayanagi, N ^a   Morita, K ^a   Irita, T ^a   Yamamoto, H ^a   Suzuki, S ^a   Shimizu, H ^a   Kawata, S ^a   Okino, T ^a   Suzuki, K ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Aerial image measurement; Beam edge profile; EB stepper; Electron beam lithography; Electron beam projection lithography (EPL); Image blur; Knife edge method; System calibration

Indexed keywords

CALIBRATION; FOCUSING; IMAGE SENSORS; SIGNAL TO NOISE RATIO;

AERIAL IMAGES; ELECTRON BEAM PROJECTION LITHOGRAPHY (EPL);

ELECTRON BEAM LITHOGRAPHY;

EID: 0012023680     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436679     Document Type: Conference Paper

References (5)

1. Nikon EB stepper: Its system concept and countermeasures for critical issues
2. Space-charge results from the SCALPEL proof-of-concept system
3. Electron optical system for X-ray mask writer EB-X2
4. Data of scattered electron characteristics in 100KV EB stepper
5. Electron optical image correction subsystem in electron beam projection lithography