New data post-processing for E-beam projection lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4343, Issue , 2001, Pages 88-94

  Okamoto, K ^a   Kamijo, K ^a   Kojima, S ^a   Minami, H ^a   Okino, T ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Complementary reticle; Data conversion; Data post processing; Electron beam; Electron beam projection lithography (EPL); LSI pattern; Proximity effect correction; Space charge effect; Stencil reticle; Stitching

Indexed keywords

ELECTRIC SPACE CHARGE; ELECTRON OPTICS; FOCUSING; LSI CIRCUITS; OPTICAL DATA PROCESSING; OPTICAL ROTATION;

ELECTRON BEAM PROJECTION LITHOGRAPHY (EPL);

ELECTRON BEAM LITHOGRAPHY;

EID: 0034758349     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436638     Document Type: Conference Paper

References (11)